| 2017-12 | Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition | Kim, Kangsik; Oh, Il-Kwon; Kim, Hyungjun; Lee, Zonghoon | ARTICLE | 952 |
| 2017-11 | Catalytic chemical vapor deposition of large-area uniform two-dimensional molybdenum disulfide using sodium chloride | Song, Jeong-Gyu; Ryu, Gyeong Hee; Kim, Youngjun; Woo, Whang Je; Ko, Kyung Yong; Kim, Yongsung; Lee, Changseung; Oh, Il-Kwon; Park, Jusang; Lee, Zonghoon; Kim, Hyungjun | ARTICLE | 922 |
| 2017-05 | Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors | Jung, Hanearl; Oh, Il-Kwon; Yeo, Seungmin; Kim, Hyungjun; Lee, Su Jeong; Kim, Yun Cheol; Myoung, Jae-Min; Kim, Soo-Hyun; Lim, Jun Hyung; Lee, Sunhee | ARTICLE | 114 |
| 2023-03 | Dysprosium Incorporation for Phase Stabilization of Atomic-Layer- Deposited HfO2 Thin Films | Lee, Yujin; Kim, Kangsik; Lee, Zonghoon; Lee, Hong-Sub; Lee, Han-Bo-Ram; Kim, Woo-Hee; Oh, Il-Kwon; Kim, Hyungjun | ARTICLE | 356 |
| 2016-10 | Effect of Al2O3 deposition on performance of top-gated monolayer MoS2 based field effect transistor | Song, Jeong-Gyu; Kim, Seok Jin; Woo, Whang Je; Kim, Youngjin; Oh, Il-Kwon; Ryu, Gyeong Hee; Lee, Zonghoon; Lim, Jun Hyung; Park, Jusang; Kim, Hyungjun | ARTICLE | 1157 |
| 2014-02 | Fabrication of Transferable Al2O3 Nanosheet by Atomic Layer Deposition for Graphene FET | Jung, Hanearl; Park, Jusang; Oh, Il-Kwon; Choi, Taejin; Lee, Sanggeun; Hong, Juree; Lee, Taeyoon; Kim, Soo-Hyun; Kim, Hyungjun | ARTICLE | 107 |
| 2015-01 | Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition | Oh, Il-Kwon; Kim, Kangsik; Lee, Zonghoon; Ko, Kyung Yong; Lee, Chang-Wan; Lee, Su Jeong; Myung, Jae Min; Lansalot-Matras, Clement; Noh, Wontae; Dussarrat, Christian; Kim, Hyungjun; Lee, Han-Bo-Ram | ARTICLE | 1132 |
| 2020-05 | Improved interface quality of atomic-layer-deposited ZrO2 metal-insulator-metal capacitors with Ru bottom electrodes | Lee, Jae Hwan; Park, Bo-Eun; Thompson, David; Choe, Myeonggi; Lee, Zonghoon; Oh, Il-Kwon; Kim, Woo-Hee; Kim, Hyungjun | ARTICLE | 636 |
| 2015-05 | In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides | Oh, Il-Kwon; Kim, Kangsik; Lee, Zonghoon; Song, Jeong-Gyu; Lee, Chang Wan; Thompson, David; Lee, Han-Bo-Ram; Kim, Woo-Hee; Maeng, Wan Joo; Kim, Hyungjun | ARTICLE | 2382 |
| 2015-04-10 | Nanoscale Hydrophobic Coating by Atomic Layer Deposition Rare Earth Oxides | Lee, Zonghoon; Oh, Il-Kwon; Kim, Kangsik; Ko, Kyeongyong; Lee, Seojung; Myung, JM; Lansalot-matras, Clement; Noh, Wontae; Kim, Hyungjoon; Lee, Hanboram | CONFERENCE | 553 |
| 2015-09 | Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices | Oh, Il-Kwon; Tanskanen, Jukka; Jung, Hanearl; Kim, Kangsik; Lee, Mi Jin; Lee, Zonghoon; Lee, Seoung-Ki; Ahn, Jong-Hyun; Lee, Chang Wan; Kim, Kwanpyo; Kim, Hyungjun; Lee, Han-Bo-Ram | ARTICLE | 1155 |
| 2019-11 | Reaction Mechanism of Pt Atomic Layer Deposition on Various Textile Surfaces | Oh, Il-Kwon; Park, Jong Seo; Khan, Mohammad Rizwan; Kim, Kangsik; Lee, Zonghoon; Shong, Bonggeun; Lee, Han-Bo-Ram | ARTICLE | 513 |
| 2023-06 | Recent Advances in Triboelectric Nanogenerators: From Technological Progress to Commercial Applications | Choi, Dongwhi; Lee, Younghoon; Lin, Zong-Hong; Cho, Sumin; Kim, Miso; Ao, Chi Kit; Soh, Siowling; Sohn, Changwan; Jeong, Chang Kyu; Lee, Jeongwan; Lee, Minbaek; Lee, Seungah; Ryu, Jungho; Parashar, Parag; Cho, Yujang; Ahn, Jaewan; Kim, Il-Doo; Jiang, Feng; Lee, Pooi See; Khandelwal, Gaurav; Kim, Sang-Jae; Kim, Hyun Soo; Song, Hyun-Cheol; Kim, Minje; Nah, Junghyo; Kim, Wook; Menge, Habtamu Gebeyehu; Park, Yong Tae; Xu, Wei; Hao, Jianhua; Park, Hyosik; Lee, Ju-Hyuck; Lee, Dong-Min; Kim, Sang-Woo; Park, Ji Young; Zhang, Haixia; Zi, Yunlong; Guo, Ru; Cheng, Jia; Yang, Ze; Xie, Yannan; Lee, Sangmin; Chung, Jihoon; Oh, Il-Kwon; Kim, Ji-Seok; Cheng, Tinghai; Gao, Qi; Cheng, Gang; Gu, Guangqin; Shim, Minseob; Jung, Jee-Hoon; Yun, Changwoo; Zhang, Chi; Liu, Guoxu; Chen, Yufeng; Kim, Suhan; Chen, Xiangyu; Hu, Jun; Pu, Xiong; Guo, Zi Hao; Wang, Xudong; Chen, Jun; Xiao, Xiao; Xie, Xing; Jarin, Mourin; Zhang, Hulin; Lai, Ying-Chih; He, Tianyiyi; Kim, Hakjeong; Park, Inkyu; Ahn, Junseong; Huynh, Nghia Dinh; Yang, Ya; Wang, Zhong Lin; Baik, Jeong Min; Choi, Dukhyun | ARTICLE | 211 |
| 2014-04 | Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition | Kim, Woo-Hee; Kim, Min-Kyu; Oh, Il-Kwon; Maeng, Wan Joo; Cheon, Taehoon; Kim, Soo-Hyun; Noori, Atif; Thompson, David; Chu, Schubert; Kim, Hyungjun | ARTICLE | 97 |
| 2020-01 | Surface Energy Change of Atomic-Scale Metal Oxide Thin Films by Phase Transformation | Oh, Il-Kwon; Zeng, Li; Kim, Jae-Eun; Park, Jong-Seo; Kim, Kangsik; Lee, Hyunsoo; Seo, Seunggi; Khan, Mohammad Rizwan; Kim, Sangmo; Park, Chung Wung; Lee, Junghoon; Shong, Bonggeun; Lee, Zonghoon; Bent, Stacey F.; Kim, Hyungjun; Park, Jeong Young; Lee, Han-Bo-Ram | ARTICLE | 526 |
| 2016-08 | Surface treatment process applicable to next generation graphene-based electronics | Kim, Ki Seok; Hong, Hyo-Ki; Jung, Haneal; Oh, Il-Kwon; Lee, Zonghoon; Kim, Hyungjun; Yeom, Geun Young; Kim, Kyong Nam | ARTICLE | 1090 |
| 2014-03 | Synthesis of wafer-scale uniform molybdenum disulfide films with control over the layer number using a gas phase sulfur precursor | Lee, Youngbin; Lee, Jinhwan; Bark, Hunyoung; Oh, Il-Kwon; Ryu, Gyeong Hee; Lee, Zonghoon; Kim, Hyungjun; Cho, Jeong Ho; Ahn, Jong-Hyun; Lee, Changgu | ARTICLE | 1330 |
| 2022-07 | Unveiling the Effect of Superlattice Interfaces and Intermixing on Phase Change Memory Performance | Khan, Asir Intisar; Wu, Xiangjin; Perez, Christopher; Won, Byoungjun; Kim, Kangsik; Ramesh, Pranav; Kwon, Heungdong; Tung, Maryann C.; Lee, Zonghoon; Oh, Il-Kwon; Saraswat, Krishna; Asheghi, Mehdi; Goodson, Kenneth E.; Wong, H. -S. Philip; Pop, Eric | ARTICLE | 292 |
| 2016-11 | Very high frequency plasma reactant for atomic layer deposition | Oh, Il-Kwon; Yoo, Gilsang; Yoon, Chang Mo; Kim, Tae Hyung; Yeom, Geun Young; Kim, Kangsik; Lee, Zonghoon; Jung, Hanearl; Lee, Chang Wan; Kim, Hyungjun; Lee, Han-Bo-Ram | ARTICLE | 988 |
