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Lee, Zonghoon
Atomic-Scale Electron Microscopy Lab.
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Reaction Mechanism of Pt Atomic Layer Deposition on Various Textile Surfaces

Author(s)
Oh, Il-KwonPark, Jong SeoKhan, Mohammad RizwanKim, KangsikLee, ZonghoonShong, BonggeunLee, Han-Bo-Ram
Issued Date
2019-11
DOI
10.1021/acs.chemmater.9b03171
URI
https://scholarworks.unist.ac.kr/handle/201301/30673
Fulltext
https://pubs.acs.org/doi/10.1021/acs.chemmater.9b03171
Citation
CHEMISTRY OF MATERIALS, v.31, no.21, pp.8995 - 9002
Abstract
The reaction mechanism of Pt atomic layer deposition (ALD) on various commercial textiles such as cotton, silk, nylon, wool, Kevlar, and Nomex was fundamentally investigated. Pt morphologies on textiles were observed, and it was determined that Pt layers were uniformly deposited on most textile surfaces except nylon, where no notable Pt growth was observed. Morphological analysis, chemical composition measurements as a function of Pt ALD cycles, and the results of quantum chemical calculations enabled the elucidation of the role of the textiles and Pt growth mechanism. The calculated reaction pathways and energy states of Pt precursor molecules that adsorbed on each textile moiety showed different reaction paths, resulting in various Pt ALD growth behaviors. On the basis of the Pt ALD process, a textile resistive heater was fabricated, showing good performance with high stability such as wear rate, high bending stability, and long life.
Publisher
AMER CHEMICAL SOC
ISSN
0897-4756
Keyword
WEARABLE ELECTRONICSHEATERANTIBACTERIALFABRICATIONPRESSUREBEHAVIORSENSORCOTTONFILMS

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