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Versatile control of metal-assisted chemical etching for vertical silicon microwire arrays and their photovoltaic applications

Author(s)
Han-Don UmNamwoo KimKangmin LeeInchan HwangJi Hoon SeoYoung J. YuPeter DuaneMunib WoberSeo, Kwanyong
Issued Date
2015-06
DOI
10.1038/srep11277
URI
https://scholarworks.unist.ac.kr/handle/201301/12624
Fulltext
http://www.nature.com/srep/2015/150610/srep11277/full/srep11277.html
Citation
SCIENTIFIC REPORTS, v.5, pp.11277
Abstract
A systematic study was conducted into the use of metal-assisted chemical etching (MacEtch) to fabricate vertical Si microwire arrays, with several models being studied for the efficient redox reaction of reactants with silicon through a metal catalyst by varying such parameters as the thickness and morphology of the metal film. By optimizing the MacEtch conditions, high-quality vertical Si microwires were successfully fabricated with lengths of up to 23.2 mu m, which, when applied in a solar cell, achieved a conversion efficiency of up to 13.0%. These solar cells also exhibited an open-circuit voltage of 547.7 mV, a short-circuit current density of 33.2 mA/cm(2), and a fill factor of 71.3% by virtue of the enhanced light absorption and effective carrier collection provided by the Si microwires. The use of MacEtch to fabricate high-quality Si microwires therefore presents a unique opportunity to develop cost-effective and highly efficient solar cells.
Publisher
NATURE PUBLISHING GROUP
ISSN
2045-2322
Keyword
SOLAR-CELLSNANOWIRE ARRAYSSI MICROWIRETHIN-FILMSFABRICATIONSURFACEKINETICSUNIFORMPLANAR

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