Versatile control of metal-assisted chemical etching for vertical silicon microwire arrays and their photovoltaic applications
Cited 1 times inCited 0 times in
- Versatile control of metal-assisted chemical etching for vertical silicon microwire arrays and their photovoltaic applications
- Han-Don Um; Namwoo Kim; Kangmin Lee; Inchan Hwang; Ji Hoon Seo; Young J. Yu; Peter Duane; Munib Wober; Seo, Kwanyong
- Issue Date
- NATURE PUBLISHING GROUP
- SCIENTIFIC REPORTS, v.5, pp.11277
- A systematic study was conducted into the use of metal-assisted chemical etching (MacEtch) to fabricate vertical Si microwire arrays, with several models being studied for the efficient redox reaction of reactants with silicon through a metal catalyst by varying such parameters as the thickness and morphology of the metal film. By optimizing the MacEtch conditions, high-quality vertical Si microwires were successfully fabricated with lengths of up to 23.2 mu m, which, when applied in a solar cell, achieved a conversion efficiency of up to 13.0%. These solar cells also exhibited an open-circuit voltage of 547.7 mV, a short-circuit current density of 33.2 mA/cm(2), and a fill factor of 71.3% by virtue of the enhanced light absorption and effective carrier collection provided by the Si microwires. The use of MacEtch to fabricate high-quality Si microwires therefore presents a unique opportunity to develop cost-effective and highly efficient solar cells.
- Appears in Collections:
- ECHE_Journal Papers
- Files in This Item:
can give you direct access to the published full text of this article. (UNISTARs only)
Show full item record
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.