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Atomic layer deposited Mo2N thin films using Mo(CO)(6) and NH3 plasma as a Cu diffusion barrier File

Joo, Yong-Hwan , Nandi, Dip K. , Ramesh, Rahul , Jang, Yujin , Bae, Jong-Seong , Cheon, Taehoon , Kim, Soo-Hyun

Article Issue Date2021-03 View4

Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects File

Kim, Youn-Hye , Kim, Minsu , Kotsugi, Yohei , Cheon, Taehoon , Mohapatra, Debananda , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Ramesh, Rahul , An, Ki-Seok , et al

Article Issue Date2022-10 View25

Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting File

Kim, Deok-Hyun , Ramesh, Rahul , Nandi, Dip K. , Bae, Jong-Seong , Kim, Soo-Hyun

Article Issue Date2021-02 View10

Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier File

Kim, Jun Beom , Nandi, Dip K. , Kim, Tae Hyun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2019-09 View11

Ferroelectric Polarization Rotation in Order-Disorder-Type LiNbO3 Thin Films File

Yoo, Tae Sup , Lee, Sang A , Roh, Changjae , Kang, Seunghun , Seol, Daehee , Guan, Xinwei , Bae, Jong-Seong , Kim, Jiwoong , Kim, Young-Min , Jeong, Hu Young , et al

Article Issue Date2018-12 View8

Fluorine-free Plasma Enhanced Atomic Layer Deposited Ultrathin Tungsten Nitride Thin Films for Dual Diffusion Barrier Performance File

Seo, Kang-Min , Mohapatra, Debananda , Bae, Gun-Woo , Ansari, Mohd Zahid , Son, Yeseul , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2023-12 View20

Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage File

Nandi, Dip K. , Sahoo, Sumanta , Kim, Tae Hyun , Cheon, Taehoon , Sinha, Soumyadeep , Rahul, Ramesh , Jang, Yujin , Bae, Jong-Seong , Heo, Jaeyeong , Shim, Jae-Jin , et al

Article Issue Date2018-08 View8

Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications File

Yeo, Seungmin , Nandi, Dip K. , Rahul, R. , Kim, Tae Hyun , Shong, Bonggeun , Jang, Yujin , Bae, Jong-Seong , Han, Jeong Woo , Kim, Soo-Hyun , Kim, Hyungjun

Article Issue Date2018-11 View13

New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition File

Ansari, Mohd Zahid , Janicek, Petr , Namgung, Sook , Kim, Hyangil , Nandi, Dip K. , Cheon, Taehoon , Siddiqui, Masoom Raza , Imran, Muhammad , Jang, Yujin , Bae, Jong-Seong , et al

Article Issue Date2024-03 View8

Phase-controlled growth of cobalt oxide thin films by atomic layer deposition File

Jung, Soonyoung , Nandi, Dip K. , Yeo, Seungmin , Kim, Hyungjun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2018-03 View10

Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View12

Strong ferromagnetism in Pt-coated ZnCoO: The role of interstitial hydrogen File

Shin, Jong Moon , Lee, Ho Sik , Cha, Su Young , Lee, Seunghun , Kim, Ji Young , Park, Noejung , Cho, Yong Chan , Kim, Su Jae , Kim, Sung-Kyu , Bae, Jong-Seong , et al

Article Issue Date2012-04 View7

Ultrahigh dielectric permittivity in oxide ceramics by hydrogenation File File

Duong, Nguyen Xuan , Jang, Ji-Soo , Jung, Min-Hyoung , Bae, Jong-Seong , Ahn, Chang Won , Jin, Jong Sung , Ihm, Kyuwook , Kim, Gyehyeon , Lim, So Yeon , Lee, Jongmin , et al

Article Issue Date2023-02 View19

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