Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage

Abstract

Molybdenum nitride (MoNx) was directly grown on 3-dimensional Ni-foam (NF) at relatively low temperature of 250 degrees C by atomic layer deposition (ALD) and then tested as an electrode for charge storage. The successful formation of MoNx@NF composite was confirmed by several characterization techniques. The scanning and transmission electron microscopy analyses showed the extremely uniform and conformal coating of the MoNx on NF. The presence of NF influenced the redox-reactions in the composite and established the composite as a potential electrode for efficient charge-storage. High areal capacity (geometrical) of 130 mC/cm(2) was achieved at a current density of 2 mA/cm(2). The excellent cyclic stability reflected the conducting nature of the composite.