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dc.citation.conferencePlace US -
dc.citation.title IEEE International Electron Devices Meeting -
dc.contributor.author Kim, Bong Ho -
dc.contributor.author Kim, Seong Kwang -
dc.contributor.author Kuk, Song-hyeon -
dc.contributor.author Suh, Yoon-Je -
dc.contributor.author Jeong, Jaeyong -
dc.contributor.author Kim, Joon Pyo -
dc.contributor.author Geum, Dae-Myeong -
dc.contributor.author Kim, Sanghyeon -
dc.date.accessioned 2026-03-27T14:02:52Z -
dc.date.available 2026-03-27T14:02:52Z -
dc.date.created 2026-03-26 -
dc.date.issued 2023-12-09 -
dc.description.abstract We investigated the effects of interfacial layer scavenging on the performance and reliability of HZO-based ferroelectric field-effect transistors (FeFETs). IL scavenging effectively reduced operating voltage and improved endurance/retention characteristics. The sub-loop operation and recovery strategies are proposed to extend the endurance characteristics of FeFETs. The results provide insights into the degradation/recovery mechanisms of gate stacks in FeFETs and highlight the importance of recovery speed and controlled IL. -
dc.identifier.bibliographicCitation IEEE International Electron Devices Meeting -
dc.identifier.doi 10.1109/IEDM45741.2023.10413731 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/91129 -
dc.identifier.url https://ieeexplore.ieee.org/abstract/document/10413731 -
dc.language 영어 -
dc.publisher IEEE -
dc.title IL Scavenging and Recovery Strategies to Improve the Performance and Reliability of HZO-Based FeFETs -
dc.type Conference Paper -
dc.date.conferenceDate 2023-12-09 -

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