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Jang, Ji-Hyun
Nano Crystal Lab (NCL)
Research Interests
  • Graphene, photoelectrochemical (PEC) H2 generation, ORR/OER, SERS,3D-Nanostructures, supercapacitors, thermoelectric materials

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Cyclopropyl-containing photoacid generators for chemically amplified resists

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Title
Cyclopropyl-containing photoacid generators for chemically amplified resists
Author
Kim, JBJang, Ji-HyunKim, HWWoo, SG
Issue Date
2003-06
Publisher
CHEMICAL SOC JAPAN
Citation
CHEMISTRY LETTERS, v.32, no.6, pp.554 - 555
Abstract
Several cyclopropyl-containing photoacid generators (PAGs) were synthesized in order to reduce absorbance at 193 nm and induce the photobleaching effect. From the GC-mass experiment, cleavage of S-C(cyclopropyl) which is more preferential than that of S-C(phenyl) results in photobleaching effect. The resist containing cyclopropyldiphenylsulfonium triflate gave better resolution than the resist containing the conventional PAG, triphenylsulfonium triflate.
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ISSN
0366-7022
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ECHE_Journal Papers
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