File Download
There are no files associated with this item.
SFX Link
- Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
- Jang, Ji-Hyun
- Structures & Sustainable Energy Lab.
Views & Downloads
Detailed Information
Cited time in 
Cited time in 
Cited time in
Metadata Downloads
Cyclopropyl-containing photoacid generators for chemically amplified resists
- Author(s)
- Kim, JB, Jang, Ji-Hyun, Kim, HW, Woo, SG
- Issued Date
- 2003-06
- Citation
- CHEMISTRY LETTERS, v.32, no.6, pp.554 - 555
- Abstract
- Several cyclopropyl-containing photoacid generators (PAGs) were synthesized in order to reduce absorbance at 193 nm and induce the photobleaching effect. From the GC-mass experiment, cleavage of S-C(cyclopropyl) which is more preferential than that of S-C(phenyl) results in photobleaching effect. The resist containing cyclopropyldiphenylsulfonium triflate gave better resolution than the resist containing the conventional PAG, triphenylsulfonium triflate.
- Publisher
- CHEMICAL SOC JAPAN
- ISSN
- 0366-7022
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.