Cyclopropyl-containing photoacid generators for chemically amplified resists
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- Cyclopropyl-containing photoacid generators for chemically amplified resists
- Kim, JB; Jang, Ji-Hyun; Kim, HW; Woo, SG
- Issue Date
- CHEMICAL SOC JAPAN
- CHEMISTRY LETTERS, v.32, no.6, pp.554 - 555
- Several cyclopropyl-containing photoacid generators (PAGs) were synthesized in order to reduce absorbance at 193 nm and induce the photobleaching effect. From the GC-mass experiment, cleavage of S-C(cyclopropyl) which is more preferential than that of S-C(phenyl) results in photobleaching effect. The resist containing cyclopropyldiphenylsulfonium triflate gave better resolution than the resist containing the conventional PAG, triphenylsulfonium triflate.
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