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장지현

Jang, Ji-Hyun
Structures & Sustainable Energy Lab.
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dc.citation.endPage 555 -
dc.citation.number 6 -
dc.citation.startPage 554 -
dc.citation.title CHEMISTRY LETTERS -
dc.citation.volume 32 -
dc.contributor.author Kim, JB -
dc.contributor.author Jang, Ji-Hyun -
dc.contributor.author Kim, HW -
dc.contributor.author Woo, SG -
dc.date.accessioned 2023-12-22T11:11:27Z -
dc.date.available 2023-12-22T11:11:27Z -
dc.date.created 2014-11-18 -
dc.date.issued 2003-06 -
dc.description.abstract Several cyclopropyl-containing photoacid generators (PAGs) were synthesized in order to reduce absorbance at 193 nm and induce the photobleaching effect. From the GC-mass experiment, cleavage of S-C(cyclopropyl) which is more preferential than that of S-C(phenyl) results in photobleaching effect. The resist containing cyclopropyldiphenylsulfonium triflate gave better resolution than the resist containing the conventional PAG, triphenylsulfonium triflate. -
dc.identifier.bibliographicCitation CHEMISTRY LETTERS, v.32, no.6, pp.554 - 555 -
dc.identifier.issn 0366-7022 -
dc.identifier.scopusid 2-s2.0-0041760410 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/9106 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0041760410 -
dc.identifier.wosid 000183507100039 -
dc.language 영어 -
dc.publisher CHEMICAL SOC JAPAN -
dc.title Cyclopropyl-containing photoacid generators for chemically amplified resists -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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