dc.citation.endPage |
555 |
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dc.citation.number |
6 |
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dc.citation.startPage |
554 |
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dc.citation.title |
CHEMISTRY LETTERS |
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dc.citation.volume |
32 |
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dc.contributor.author |
Kim, JB |
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dc.contributor.author |
Jang, Ji-Hyun |
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dc.contributor.author |
Kim, HW |
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dc.contributor.author |
Woo, SG |
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dc.date.accessioned |
2023-12-22T11:11:27Z |
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dc.date.available |
2023-12-22T11:11:27Z |
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dc.date.created |
2014-11-18 |
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dc.date.issued |
2003-06 |
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dc.description.abstract |
Several cyclopropyl-containing photoacid generators (PAGs) were synthesized in order to reduce absorbance at 193 nm and induce the photobleaching effect. From the GC-mass experiment, cleavage of S-C(cyclopropyl) which is more preferential than that of S-C(phenyl) results in photobleaching effect. The resist containing cyclopropyldiphenylsulfonium triflate gave better resolution than the resist containing the conventional PAG, triphenylsulfonium triflate. |
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dc.identifier.bibliographicCitation |
CHEMISTRY LETTERS, v.32, no.6, pp.554 - 555 |
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dc.identifier.issn |
0366-7022 |
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dc.identifier.scopusid |
2-s2.0-0041760410 |
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dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/9106 |
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dc.identifier.url |
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0041760410 |
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dc.identifier.wosid |
000183507100039 |
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dc.language |
영어 |
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dc.publisher |
CHEMICAL SOC JAPAN |
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dc.title |
Cyclopropyl-containing photoacid generators for chemically amplified resists |
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dc.type |
Article |
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dc.description.journalRegisteredClass |
scopus |
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