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Shin, Tae Joo
Synchrotron Radiation Research Lab.
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Exploration of residual strain in HfO2 thin films using the 2D-GIXD synchrotron technique

Author(s)
Lee, SeunghunShin, Tae Joo
Issued Date
2025-06-04
URI
https://scholarworks.unist.ac.kr/handle/201301/89978
Citation
2025 IEEE International Interconnect Technology Conference (IITC)
Publisher
The Institute of Electrical and Electronics Engineers

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