| dc.citation.conferencePlace |
KO |
- |
| dc.citation.conferencePlace |
부산 |
- |
| dc.citation.title |
2025 IEEE International Interconnect Technology Conference (IITC) |
- |
| dc.contributor.author |
Lee, Seunghun |
- |
| dc.contributor.author |
Shin, Tae Joo |
- |
| dc.date.accessioned |
2026-01-07T14:26:42Z |
- |
| dc.date.available |
2026-01-07T14:26:42Z |
- |
| dc.date.created |
2026-01-07 |
- |
| dc.date.issued |
2025-06-04 |
- |
| dc.identifier.bibliographicCitation |
2025 IEEE International Interconnect Technology Conference (IITC) |
- |
| dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/89978 |
- |
| dc.language |
영어 |
- |
| dc.publisher |
The Institute of Electrical and Electronics Engineers |
- |
| dc.title |
Exploration of residual strain in HfO2 thin films using the 2D-GIXD synchrotron technique |
- |
| dc.type |
Conference Paper |
- |
| dc.date.conferenceDate |
2025-06-02 |
- |