File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
Related Researcher

신태주

Shin, Tae Joo
Synchrotron Radiation Research Lab.
Read More

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Full metadata record

DC Field Value Language
dc.citation.conferencePlace KO -
dc.citation.conferencePlace 부산 -
dc.citation.title 2025 IEEE International Interconnect Technology Conference (IITC) -
dc.contributor.author Lee, Seunghun -
dc.contributor.author Shin, Tae Joo -
dc.date.accessioned 2026-01-07T14:26:42Z -
dc.date.available 2026-01-07T14:26:42Z -
dc.date.created 2026-01-07 -
dc.date.issued 2025-06-04 -
dc.identifier.bibliographicCitation 2025 IEEE International Interconnect Technology Conference (IITC) -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/89978 -
dc.language 영어 -
dc.publisher The Institute of Electrical and Electronics Engineers -
dc.title Exploration of residual strain in HfO2 thin films using the 2D-GIXD synchrotron technique -
dc.type Conference Paper -
dc.date.conferenceDate 2025-06-02 -

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.