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김수현

Kim, Soo-Hyun
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Highly Conductive ALD-WCₓ Ultrathin Diffusion Barriers for Cu and Ru Interconnects

Author(s)
Seo, DongbeomKim, Sang BokKim, Soo-Hyun
Issued Date
2025-11-06
URI
https://scholarworks.unist.ac.kr/handle/201301/89442
Citation
제4회 2025 한국표면분석학회 종합학술대회
Publisher
한국표면분석학회

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