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Yoon, Tae-Sik
Nano Semiconductor Research Lab.
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Retention 개선을 위한 원자층 증착 HfO2 나노결정 차지트랩 플래시 메모리 소자 연구

Author(s)
Noh, TaeyunYoon, Tae-Sik
Issued Date
2025-06-19
URI
https://scholarworks.unist.ac.kr/handle/201301/88918
Citation
2025 한국전기전자재료학회 하계학술대회
Publisher
한국전기전자재료학회

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