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- Yoon, Tae-Sik
- Nano Semiconductor Research Lab.
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.conferencePlace | KO | - |
| dc.citation.title | 2025 한국전기전자재료학회 하계학술대회 | - |
| dc.contributor.author | Noh, Taeyun | - |
| dc.contributor.author | Yoon, Tae-Sik | - |
| dc.date.accessioned | 2025-12-08T17:55:40Z | - |
| dc.date.available | 2025-12-08T17:55:40Z | - |
| dc.date.created | 2025-12-06 | - |
| dc.date.issued | 2025-06-19 | - |
| dc.identifier.bibliographicCitation | 2025 한국전기전자재료학회 하계학술대회 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/88918 | - |
| dc.language | 한국어 | - |
| dc.publisher | 한국전기전자재료학회 | - |
| dc.title | Retention 개선을 위한 원자층 증착 HfO2 나노결정 차지트랩 플래시 메모리 소자 연구 | - |
| dc.type | Conference Paper | - |
| dc.date.conferenceDate | 2025-06-18 | - |
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