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Jeong, Changwook
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Enhancement of In2O3 Field-Effect Mobility Up To 152 cm2V-1s-1 Using HZO-Based Higher-k Linear Dielectric

Author(s)
Lin, ZehaoNiu, ChangJang, HyeongjunKim, TaehyunJeong, ChangwookYe, Peide
Issued Date
2024-06-10
URI
https://scholarworks.unist.ac.kr/handle/201301/85803
Citation
IEEE Symposium on VLSI Technology
Publisher
IEEE

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