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Jeong, Changwook
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dc.citation.conferencePlace US -
dc.citation.title IEEE Symposium on VLSI Technology -
dc.contributor.author Lin, Zehao -
dc.contributor.author Niu, Chang -
dc.contributor.author Jang, Hyeongjun -
dc.contributor.author Kim, Taehyun -
dc.contributor.author Jeong, Changwook -
dc.contributor.author Ye, Peide -
dc.date.accessioned 2025-01-06T18:05:08Z -
dc.date.available 2025-01-06T18:05:08Z -
dc.date.created 2025-01-06 -
dc.date.issued 2024-06-10 -
dc.identifier.bibliographicCitation IEEE Symposium on VLSI Technology -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/85803 -
dc.publisher IEEE -
dc.title Enhancement of In2O3 Field-Effect Mobility Up To 152 cm2V-1s-1 Using HZO-Based Higher-k Linear Dielectric -
dc.type Conference Paper -
dc.date.conferenceDate 2024-06-08 -

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