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Rho, Yoonsoo
Photonics Research in Manufacturing and Advanced Diagnostics Lab.
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Photoluminescence probing of light absorption centers at silica laser damage

Author(s)
Rho, YoonsooDaeumer, Matthias A.Miller, Christopher F.Mah, Christopher M.Laurence, Ted A.Carr, Christopher W.Yoo, Jae Hyuck
Issued Date
2024-07
DOI
10.1364/OE.527241
URI
https://scholarworks.unist.ac.kr/handle/201301/83585
Citation
OPTICS EXPRESS, v.32, no.15, pp.26632 - 26639
Abstract
We use photoluminescence (PL) imaging to study damage growth precursors within laser damage sites on the surface of silica. Damage site evolution is induced by multiple shots of UV nanosecond pulsed laser at various energy densities and monitored throughout the early stages of growth. Wide-field PL imaging rapidly locates microscopic light absorption centers within the silica damage site. Our quantitative analysis shows that damage sites with strong local PL intensity show a higher probability of growth upon subsequent laser pulses. Scanning electron microscopy (SEM) paired with a study of PL spectrum shows that the strong PL intensity appears from the subsurface fractures with high defect density, which provides a local light absorption center leading to significant damage growth. We believe that this result offers an efficient optical damage mitigation strategy by providing a rapid and non-destructive optical inspection approach. (c) 2024 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
Publisher
Optica Publishing Group
ISSN
1094-4087
Keyword
SITESPRECURSORSDEFECTSOPTICSUVFUSED-SILICAEXIT-SURFACEGROWTH-BEHAVIORLARGE-APERTURE

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