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Jeong, Hoon Eui
Multiscale Biomimetics and Manufacturing Lab.
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Wettability of nanoengineered dual-roughness surfaces fabricated by UV-assisted capillary force lithography

Author(s)
Jeong, Hoon EuiKwak, Moon KyuPark, Chan IckSuh, Kahp Yang
Issued Date
2009-11
DOI
10.1016/j.jcis.2009.07.020
URI
https://scholarworks.unist.ac.kr/handle/201301/7378
Fulltext
https://linkinghub.elsevier.com/retrieve/pii/S0021979709009084
Citation
JOURNAL OF COLLOID AND INTERFACE SCIENCE, v.339, no.1, pp.202 - 207
Abstract
Micro- and nanoscale combined hierarchical polymer structures were fabricated by UV-assisted capillary force lithography. The method is based on the sequential application of engraved polymer molds with a UV-curable resin of polyurethane acrylate (PUA) followed by surface treatment with a trichloro(1H,1H,2H,2H-perfluorooctyl) silane in vapor phase. Two distinct wetting states were observed on these dual-roughness structures. One is "Cassie-Wenzel state" where a water droplet forms heterogeneous contact with microstructures and homogeneous contact with nanostructures. The other is "Cassie-Cassie state" where a droplet makes heterogeneous contact both with micro- and nanostructures. A simple thermodynamic model was developed to explain static contact angle, hysteresis, and wetting transition on dual-roughness structures.
Publisher
ACADEMIC PRESS INC ELSEVIER SCIENCE
ISSN
0021-9797

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