Wettability of nanoengineered dual-roughness surfaces fabricated by UV-assisted capillary force lithography
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- Wettability of nanoengineered dual-roughness surfaces fabricated by UV-assisted capillary force lithography
- Jeong, Hoon Eui; Kwak, Moon Kyu; Park, Chan Ick; Suh, Kahp Yang
- Dual roughness; Hierarchical structure; Lithography; Wettability
- Issue Date
- ACADEMIC PRESS INC ELSEVIER SCIENCE
- JOURNAL OF COLLOID AND INTERFACE SCIENCE, v.339, no.1, pp.202 - 207
- Micro- and nanoscale combined hierarchical polymer structures were fabricated by UV-assisted capillary force lithography. The method is based on the sequential application of engraved polymer molds with a UV-curable resin of polyurethane acrylate (PUA) followed by surface treatment with a trichloro(1H,1H,2H,2H-perfluorooctyl) silane in vapor phase. Two distinct wetting states were observed on these dual-roughness structures. One is "Cassie-Wenzel state" where a water droplet forms heterogeneous contact with microstructures and homogeneous contact with nanostructures. The other is "Cassie-Cassie state" where a droplet makes heterogeneous contact both with micro- and nanostructures. A simple thermodynamic model was developed to explain static contact angle, hysteresis, and wetting transition on dual-roughness structures.
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