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Kim, So Youn
Laboratory for Soft Materials Nanophysics
Research Interests
  • Colloids, particle dispersions, polymer nanocomposite, block copolymers

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Metal-Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio

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Title
Metal-Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio
Author
Kim, So YounGwyther, JessicaManners, IanChaikin, Paul M.Register, Richard A.
Keywords
LITHOGRAPHY; ORIENTATION; TEMPLATES; SILICON; POLY(FERROCENYLDIMETHYLSILANES); NANOSTRUCTURES; POLYMERIZATION; PATTERNS; TRENCHES; DOMAINS
Issue Date
2014-02
Publisher
WILEY-V C H VERLAG GMBH
Citation
ADVANCED MATERIALS, v.26, no.5, pp.791 - 795
Abstract
Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane)diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.
URI
https://scholarworks.unist.ac.kr/handle/201301/7213
DOI
10.1002/adma.201303452
ISSN
0935-9648
Appears in Collections:
ECHE_Journal Papers
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