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- Kim, So Youn
- Laboratory for Soft Materials Nanophysics
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.endPage | 795 | - |
| dc.citation.number | 5 | - |
| dc.citation.startPage | 791 | - |
| dc.citation.title | ADVANCED MATERIALS | - |
| dc.citation.volume | 26 | - |
| dc.contributor.author | Kim, So Youn | - |
| dc.contributor.author | Gwyther, Jessica | - |
| dc.contributor.author | Manners, Ian | - |
| dc.contributor.author | Chaikin, Paul M. | - |
| dc.contributor.author | Register, Richard A. | - |
| dc.date.accessioned | 2023-12-22T03:06:48Z | - |
| dc.date.available | 2023-12-22T03:06:48Z | - |
| dc.date.created | 2014-10-15 | - |
| dc.date.issued | 2014-02 | - |
| dc.description.abstract | Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane)diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency. | - |
| dc.identifier.bibliographicCitation | ADVANCED MATERIALS, v.26, no.5, pp.791 - 795 | - |
| dc.identifier.doi | 10.1002/adma.201303452 | - |
| dc.identifier.issn | 0935-9648 | - |
| dc.identifier.scopusid | 2-s2.0-84895060800 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/7213 | - |
| dc.identifier.wosid | 000336043500019 | - |
| dc.language | 영어 | - |
| dc.publisher | WILEY-V C H VERLAG GMBH | - |
| dc.title | Metal-Containing Block Copolymer Thin Films Yield Wire Grid Polarizers with High Aspect Ratio | - |
| dc.type | Article | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
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