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장지현

Jang, Ji-Hyun
Structures & Sustainable Energy Lab.
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Environmentally Friendly Negative Resists Based on Acid-Catalyzed Acetalization for 193-nm Lithography

Author(s)
Kim, JBJang, Ji-HyunKo, JSChoi, JHLee, K.-K.
Issued Date
2003-10
DOI
10.1002/marc.200350032
URI
https://scholarworks.unist.ac.kr/handle/201301/6770
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0242443875
Citation
MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882
Abstract
Novel water-developable negative resists were designed to induce both crosslinking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced crosslinking , polarity change, and an increase in dry-etch resistance. The resist formulated with this polymer and cast in a water/ethanol mixture showed 0.7 mum line and space patterns using a mercury-xenon lamp in a contact printing mode and pure water as a developer.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
1022-1336

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