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Jang, Ji-Hyun
Nano Crystal Lab (NCL)
Research Interests
  • Graphene, photoelectrochemical (PEC) H2 generation, ORR/OER, SERS,3D-Nanostructures, supercapacitors, thermoelectric materials

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Environmentally Friendly Negative Resists Based on Acid-Catalyzed Acetalization for 193-nm Lithography

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Title
Environmentally Friendly Negative Resists Based on Acid-Catalyzed Acetalization for 193-nm Lithography
Author
Kim, JBJang, Ji-HyunKo, JSChoi, JHLee, K.-K.
Keywords
Crosslinking; Photoresists; Water-soluble polymers
Issue Date
2003-10
Publisher
WILEY-V C H VERLAG GMBH
Citation
MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882
Abstract
Novel water-developable negative resists were designed to induce both crosslinking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced crosslinking , polarity change, and an increase in dry-etch resistance. The resist formulated with this polymer and cast in a water/ethanol mixture showed 0.7 mum line and space patterns using a mercury-xenon lamp in a contact printing mode and pure water as a developer.
URI
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DOI
10.1002/marc.200350032
ISSN
1022-1336
Appears in Collections:
ECHE_Journal Papers
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