dc.citation.endPage |
882 |
- |
dc.citation.number |
15 |
- |
dc.citation.startPage |
879 |
- |
dc.citation.title |
MACROMOLECULAR RAPID COMMUNICATIONS |
- |
dc.citation.volume |
24 |
- |
dc.contributor.author |
Kim, JB |
- |
dc.contributor.author |
Jang, Ji-Hyun |
- |
dc.contributor.author |
Ko, JS |
- |
dc.contributor.author |
Choi, JH |
- |
dc.contributor.author |
Lee, K.-K. |
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dc.date.accessioned |
2023-12-22T11:09:08Z |
- |
dc.date.available |
2023-12-22T11:09:08Z |
- |
dc.date.created |
2014-09-29 |
- |
dc.date.issued |
2003-10 |
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dc.description.abstract |
Novel water-developable negative resists were designed to induce both crosslinking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced crosslinking , polarity change, and an increase in dry-etch resistance. The resist formulated with this polymer and cast in a water/ethanol mixture showed 0.7 mum line and space patterns using a mercury-xenon lamp in a contact printing mode and pure water as a developer. |
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dc.identifier.bibliographicCitation |
MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882 |
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dc.identifier.doi |
10.1002/marc.200350032 |
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dc.identifier.issn |
1022-1336 |
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dc.identifier.scopusid |
2-s2.0-0242443875 |
- |
dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/6770 |
- |
dc.identifier.url |
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0242443875 |
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dc.identifier.wosid |
000186391700002 |
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dc.language |
영어 |
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dc.publisher |
WILEY-V C H VERLAG GMBH |
- |
dc.title |
Environmentally Friendly Negative Resists Based on Acid-Catalyzed Acetalization for 193-nm Lithography |
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dc.type |
Article |
- |
dc.description.journalRegisteredClass |
scopus |
- |