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DC Field | Value | Language |
---|---|---|
dc.citation.endPage | 882 | - |
dc.citation.number | 15 | - |
dc.citation.startPage | 879 | - |
dc.citation.title | MACROMOLECULAR RAPID COMMUNICATIONS | - |
dc.citation.volume | 24 | - |
dc.contributor.author | Kim, JB | - |
dc.contributor.author | Jang, Ji-Hyun | - |
dc.contributor.author | Ko, JS | - |
dc.contributor.author | Choi, JH | - |
dc.contributor.author | Lee, K.-K. | - |
dc.date.accessioned | 2023-12-22T11:09:08Z | - |
dc.date.available | 2023-12-22T11:09:08Z | - |
dc.date.created | 2014-09-29 | - |
dc.date.issued | 2003-10 | - |
dc.description.abstract | Novel water-developable negative resists were designed to induce both crosslinking and polarity change upon exposure and bake. The matrix polymers were synthesized by copolymerization of glyceryl methacrylate and methacrolein. The acid-catalyzed acetalization of the polymer induced crosslinking , polarity change, and an increase in dry-etch resistance. The resist formulated with this polymer and cast in a water/ethanol mixture showed 0.7 mum line and space patterns using a mercury-xenon lamp in a contact printing mode and pure water as a developer. | - |
dc.identifier.bibliographicCitation | MACROMOLECULAR RAPID COMMUNICATIONS, v.24, no.15, pp.879 - 882 | - |
dc.identifier.doi | 10.1002/marc.200350032 | - |
dc.identifier.issn | 1022-1336 | - |
dc.identifier.scopusid | 2-s2.0-0242443875 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/6770 | - |
dc.identifier.url | http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0242443875 | - |
dc.identifier.wosid | 000186391700002 | - |
dc.language | 영어 | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.title | Environmentally Friendly Negative Resists Based on Acid-Catalyzed Acetalization for 193-nm Lithography | - |
dc.type | Article | - |
dc.description.journalRegisteredClass | scopus | - |
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