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Jang, Ji-Hyun
Nano Crystal Lab (NCL)
Research Interests
  • Graphene, photoelectrochemical (PEC) H2 generation, ORR/OER, SERS,3D-Nanostructures, supercapacitors, thermoelectric materials

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Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists

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Title
Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists
Author
Kim, JBJang, Ji-HyunKo, JSChoi, JHLee, BW
Keywords
193-nm resist; Lithocholic acid; Norbornene
Issue Date
2004
Publisher
NATURE PUBLISHING GROUP
Citation
POLYMER JOURNAL, v.36, no.1, pp.18 - 22
Abstract
Norbornene copolymers having derivatives of lithocholic acid were synthesized as matrix polymers for 193-nm lithography. Norbornene with a succinic acid ester group was introduced into the matrix polymers in order to improve adhesion to a silicon substrate without causing cross-linking during the post-exposure bake process. Dry-etching resistances of the polymers to CF4-reactive ion etching are comparable to that of poly(4-hydroxystyrene), a typical matrix resin for 248-nm lithography. The resists formulated with the polymers gave 0.15 μm line and space patterns at a dose of 14 mJ/cm2 using an ArF excimer laser stepper and a standard 2.38 wt% tetramethylammonium hydroxide aqueous solution.
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DOI
10.1295/polymj.36.18
ISSN
0032-3896
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ECHE_Journal Papers
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