File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
Related Researcher

장지현

Jang, Ji-Hyun
Structures & Sustainable Energy Lab.
Read More

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Full metadata record

DC Field Value Language
dc.citation.endPage 22 -
dc.citation.number 1 -
dc.citation.startPage 18 -
dc.citation.title POLYMER JOURNAL -
dc.citation.volume 36 -
dc.contributor.author Kim, JB -
dc.contributor.author Jang, Ji-Hyun -
dc.contributor.author Ko, JS -
dc.contributor.author Choi, JH -
dc.contributor.author Lee, BW -
dc.date.accessioned 2023-12-22T11:07:45Z -
dc.date.available 2023-12-22T11:07:45Z -
dc.date.created 2014-09-29 -
dc.date.issued 2004 -
dc.description.abstract Norbornene copolymers having derivatives of lithocholic acid were synthesized as matrix polymers for 193-nm lithography. Norbornene with a succinic acid ester group was introduced into the matrix polymers in order to improve adhesion to a silicon substrate without causing cross-linking during the post-exposure bake process. Dry-etching resistances of the polymers to CF4-reactive ion etching are comparable to that of poly(4-hydroxystyrene), a typical matrix resin for 248-nm lithography. The resists formulated with the polymers gave 0.15 μm line and space patterns at a dose of 14 mJ/cm2 using an ArF excimer laser stepper and a standard 2.38 wt% tetramethylammonium hydroxide aqueous solution. -
dc.identifier.bibliographicCitation POLYMER JOURNAL, v.36, no.1, pp.18 - 22 -
dc.identifier.doi 10.1295/polymj.36.18 -
dc.identifier.issn 0032-3896 -
dc.identifier.scopusid 2-s2.0-1542646976 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/6769 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=1542646976 -
dc.identifier.wosid 000220006000003 -
dc.language 영어 -
dc.publisher NATURE PUBLISHING GROUP -
dc.title Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists -
dc.type Article -
dc.description.journalRegisteredClass scopus -

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.