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Jang, Ji-Hyun
Nano Crystal Lab (NCL)
Research Interests
  • Graphene, photoelectrochemical (PEC) H2 generation, ORR/OER, SERS,3D-Nanostructures, supercapacitors, thermoelectric materials


Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists

DC Field Value Language Kim, JB ko Jang, Ji-Hyun ko Ko, JS ko Choi, JH ko Lee, BW ko 2014-10-02T00:25:09Z - 2014-09-29 ko 2004 ko
dc.identifier.citation POLYMER JOURNAL, v.36, no.1, pp.18 - 22 ko
dc.identifier.issn 0032-3896 ko
dc.identifier.uri -
dc.identifier.uri ko
dc.description.abstract Norbornene copolymers having derivatives of lithocholic acid were synthesized as matrix polymers for 193-nm lithography. Norbornene with a succinic acid ester group was introduced into the matrix polymers in order to improve adhesion to a silicon substrate without causing cross-linking during the post-exposure bake process. Dry-etching resistances of the polymers to CF4-reactive ion etching are comparable to that of poly(4-hydroxystyrene), a typical matrix resin for 248-nm lithography. The resists formulated with the polymers gave 0.15 μm line and space patterns at a dose of 14 mJ/cm2 using an ArF excimer laser stepper and a standard 2.38 wt% tetramethylammonium hydroxide aqueous solution. ko
dc.description.statementofresponsibility close -
dc.language ENG ko
dc.subject 193-nm resist ko
dc.subject Lithocholic acid ko
dc.subject Norbornene ko
dc.title Adhesion enhancement of norbornene polymers with lithocholate substituents for 193-nm resists ko
dc.type ARTICLE ko
dc.identifier.scopusid 2-s2.0-1542646976 ko
dc.identifier.wosid 000220006000003 ko
dc.type.rims ART ko
dc.description.wostc 6 *
dc.description.scopustc 4 * 2015-05-06 * 2014-09-29 *
dc.identifier.doi 10.1295/polymj.36.18 ko
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