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Jang, Ji-Hyun
Nano Crystal Lab (NCL)
Research Interests
  • Graphene, photoelectrochemical (PEC) H2 generation, ORR/OER, SERS,3D-Nanostructures, supercapacitors, thermoelectric materials

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Synthesis and lithographic evaluation of poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone-2-yl methacrylate)]

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Title
Synthesis and lithographic evaluation of poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone-2-yl methacrylate)]
Author
Kim, JBKo, JSChoi, JHJang, Ji-HyunOh, THKim, HWLee, BW
Keywords
γ-Butyrolactone-2-yl methacrylate; ArF lithography; Methacrylic acid tert-butyl cholate ester
Issue Date
2004-07
Publisher
ELSEVIER SCI LTD
Citation
POLYMER, v.45, no.16, pp.5397 - 5401
Abstract
Poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone- 2-yl methacrylate)] was synthesized and evaluated as a new 193-nm chemically amplified photoresist. This polymer showed good thermal stability up to 240°C and had a good transmittance at 193 nm. This material showed good resistance to CF 4-reactive ion etching. The resist patterns of 0.15 μm feature size were obtained at a dose of 11mJcm -2 using an argon fluoride excimer laser stepper.
URI
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DOI
10.1016/j.polymer.2004.05.041
ISSN
0032-3861
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ECHE_Journal Papers
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