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- Jang, Ji-Hyun
- Structures & Sustainable Energy Lab.
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Synthesis and lithographic evaluation of poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone-2-yl methacrylate)]
- Issued Date
- 2004-07
- Citation
- POLYMER, v.45, no.16, pp.5397 - 5401
- Abstract
- Poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone- 2-yl methacrylate)] was synthesized and evaluated as a new 193-nm chemically amplified photoresist. This polymer showed good thermal stability up to 240°C and had a good transmittance at 193 nm. This material showed good resistance to CF 4-reactive ion etching. The resist patterns of 0.15 μm feature size were obtained at a dose of 11mJcm -2 using an argon fluoride excimer laser stepper.
- Publisher
- ELSEVIER SCI LTD
- ISSN
- 0032-3861
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