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- Jang, Ji-Hyun
- Structures & Sustainable Energy Lab.
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.endPage | 5401 | - |
| dc.citation.number | 16 | - |
| dc.citation.startPage | 5397 | - |
| dc.citation.title | POLYMER | - |
| dc.citation.volume | 45 | - |
| dc.contributor.author | Kim, JB | - |
| dc.contributor.author | Ko, JS | - |
| dc.contributor.author | Choi, JH | - |
| dc.contributor.author | Jang, Ji-Hyun | - |
| dc.contributor.author | Oh, TH | - |
| dc.contributor.author | Kim, HW | - |
| dc.contributor.author | Lee, BW | - |
| dc.date.accessioned | 2023-12-22T10:45:46Z | - |
| dc.date.available | 2023-12-22T10:45:46Z | - |
| dc.date.created | 2014-09-30 | - |
| dc.date.issued | 2004-07 | - |
| dc.description.abstract | Poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone- 2-yl methacrylate)] was synthesized and evaluated as a new 193-nm chemically amplified photoresist. This polymer showed good thermal stability up to 240°C and had a good transmittance at 193 nm. This material showed good resistance to CF 4-reactive ion etching. The resist patterns of 0.15 μm feature size were obtained at a dose of 11mJcm -2 using an argon fluoride excimer laser stepper. | - |
| dc.identifier.bibliographicCitation | POLYMER, v.45, no.16, pp.5397 - 5401 | - |
| dc.identifier.doi | 10.1016/j.polymer.2004.05.041 | - |
| dc.identifier.issn | 0032-3861 | - |
| dc.identifier.scopusid | 2-s2.0-4143129847 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/6768 | - |
| dc.identifier.url | http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=4143129847 | - |
| dc.identifier.wosid | 000222927700003 | - |
| dc.language | 영어 | - |
| dc.publisher | ELSEVIER SCI LTD | - |
| dc.title | Synthesis and lithographic evaluation of poly[(methacrylic acid tert-butyl cholate ester)-co-(γ-butyrolactone-2-yl methacrylate)] | - |
| dc.type | Article | - |
| dc.description.journalRegisteredClass | scopus | - |
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