Electrical properties and shrinkage of carbonized photoresist films and the implications for carbon microelectromechanical systems devices in conductive media
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- Electrical properties and shrinkage of carbonized photoresist films and the implications for carbon microelectromechanical systems devices in conductive media
- Park, BY; Taherabadi, L; Wang, CL; Zoval, J; Madou, Mark
- CHEMICAL-VAPOR-DEPOSITION; LOW-TEMPERATURE REGIME; ELECTROCHEMICAL APPLICATIONS; PYROCARBON DEPOSITION; PYROLYTIC CARBON; C-MEMS; FABRICATION; CHEMISTRY; KINETICS; BENZENE
- Issue Date
- ELECTROCHEMICAL SOC INC
- JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.152, no.12, pp.J136 - J143
- Recent advances in fabricating 3D micro- and nanostructures using carbon microelectromechanical systems, or C-MEMS, has opened up a wide variety of new and exciting applications. The development of 3D C-MEMS has been catapulted forward by the use of transparent, high-viscosity resists such as SU-8. The electrical characteristics and shrinkage of various thickness carbon films derived from SU-8 and AZ P4620 are quantified and discussed in the context of the decomposition and carbonization mechanisms of epoxy and phenolic resins. Measurements obtained reveal a thickness dependence of the resistivity at lower carbonization temperatures but not much dependence at 1000 degrees C. Possible explanations for this low-temperature thickness dependence are given. The electrical characteristics of carbon films obtained from both types of photoresists carbonized at 1000 degrees C are very similar to that of glassy carbon. Simulations have been carried out to demonstrate the importance of the carbon resistivity for C-MEMS devices when used in conductive media. A method for simple optimization and verification of C-MEMS device designs for use in conductive media is introduced.
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