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RuoffRodney Scott

Ruoff, Rodney S.
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Bond-detach lithography: A method for micro/nanolithography by precision PDMS patterning

Author(s)
Thangawng, Abel L.Swartz, Melody A.Glucksberg, Matthew R.Ruoff, Rodney S.
Issued Date
2007-01
DOI
10.1002/smll.200500418
URI
https://scholarworks.unist.ac.kr/handle/201301/54432
Fulltext
https://onlinelibrary.wiley.com/doi/10.1002/smll.200500418
Citation
SMALL, v.3, no.1, pp.132 - 138
Abstract
We have discovered a micro/nanopatterning technique based on the patterning of a PDMS membrane/film, which involves bonding a PDMS structure/stamp (that has the desired patterns) to a PDMS film. The technique, which we call "bond-detach lithography", was demonstrated (in conjunction with other microfabrication techniques) by transferring several micro- and nanoscale patterns onto a variety of substrates. Bond-detach lithography is a parallel process technique in which a master mold can be used many times, and is particularly simple and inexpensive.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
1613-6810
Keyword (Author)
lithographymicrofabricationpatterningreactive ion etching
Keyword
DECAL TRANSFER LITHOGRAPHYLIGHT-EMITTING-DIODESSOFT LITHOGRAPHYNANOIMPRINT LITHOGRAPHYHIGH-RESOLUTIONNANOSPHERE LITHOGRAPHYTHIN-FILMSFABRICATIONMICROSTRUCTURESPOLYDIMETHYLSILOXANE

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