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- Ruoff, Rodney S.
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.endPage | 138 | - |
| dc.citation.number | 1 | - |
| dc.citation.startPage | 132 | - |
| dc.citation.title | SMALL | - |
| dc.citation.volume | 3 | - |
| dc.contributor.author | Thangawng, Abel L. | - |
| dc.contributor.author | Swartz, Melody A. | - |
| dc.contributor.author | Glucksberg, Matthew R. | - |
| dc.contributor.author | Ruoff, Rodney S. | - |
| dc.date.accessioned | 2023-12-22T09:37:12Z | - |
| dc.date.available | 2023-12-22T09:37:12Z | - |
| dc.date.created | 2021-10-19 | - |
| dc.date.issued | 2007-01 | - |
| dc.description.abstract | We have discovered a micro/nanopatterning technique based on the patterning of a PDMS membrane/film, which involves bonding a PDMS structure/stamp (that has the desired patterns) to a PDMS film. The technique, which we call "bond-detach lithography", was demonstrated (in conjunction with other microfabrication techniques) by transferring several micro- and nanoscale patterns onto a variety of substrates. Bond-detach lithography is a parallel process technique in which a master mold can be used many times, and is particularly simple and inexpensive. | - |
| dc.identifier.bibliographicCitation | SMALL, v.3, no.1, pp.132 - 138 | - |
| dc.identifier.doi | 10.1002/smll.200500418 | - |
| dc.identifier.issn | 1613-6810 | - |
| dc.identifier.scopusid | 2-s2.0-33846297733 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/54432 | - |
| dc.identifier.url | https://onlinelibrary.wiley.com/doi/10.1002/smll.200500418 | - |
| dc.identifier.wosid | 000243478200021 | - |
| dc.language | 영어 | - |
| dc.publisher | WILEY-V C H VERLAG GMBH | - |
| dc.title | Bond-detach lithography: A method for micro/nanolithography by precision PDMS patterning | - |
| dc.type | Article | - |
| dc.description.isOpenAccess | FALSE | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary; Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter | - |
| dc.relation.journalResearchArea | Chemistry; Science & Technology - Other Topics; Materials Science; Physics | - |
| dc.type.docType | Article | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.subject.keywordAuthor | lithography | - |
| dc.subject.keywordAuthor | microfabrication | - |
| dc.subject.keywordAuthor | patterning | - |
| dc.subject.keywordAuthor | reactive ion etching | - |
| dc.subject.keywordPlus | DECAL TRANSFER LITHOGRAPHY | - |
| dc.subject.keywordPlus | LIGHT-EMITTING-DIODES | - |
| dc.subject.keywordPlus | SOFT LITHOGRAPHY | - |
| dc.subject.keywordPlus | NANOIMPRINT LITHOGRAPHY | - |
| dc.subject.keywordPlus | HIGH-RESOLUTION | - |
| dc.subject.keywordPlus | NANOSPHERE LITHOGRAPHY | - |
| dc.subject.keywordPlus | THIN-FILMS | - |
| dc.subject.keywordPlus | FABRICATION | - |
| dc.subject.keywordPlus | MICROSTRUCTURES | - |
| dc.subject.keywordPlus | POLYDIMETHYLSILOXANE | - |
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