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Tensile measurement of single crystal gallium nitride nanowires on MEMS test stages

Author(s)
Brown, J. J.Baca, A. I.Bertness, K. A.Dikin, D. A.Ruoff, R. S.Bright, V. M.
Issued Date
2011-04
DOI
10.1016/j.sna.2010.04.002
URI
https://scholarworks.unist.ac.kr/handle/201301/54299
Fulltext
https://www.sciencedirect.com/science/article/pii/S0924424710001640?via%3Dihub
Citation
SENSORS AND ACTUATORS A-PHYSICAL, v.166, no.2, pp.177 - 186
Abstract
This paper reports direct tensile tests on n-type (Si-doped) gallium nitride single crystal nanowires(1) that were grown by nitrogen plasma-assisted molecular beam epitaxy and which are essentially free of defects and residual strain. Nanowires were integrated with actuated, active microelectromechanical (MEMS) devices using dielectrophoresis-driven self-assembly and platinum-carbon clamps created using a gallium focused ion beam. For one nanowire, failure strain of 0.042 +/- 0.011 was found. Most nanowire specimens appeared to demonstrate tensile strength in the range of 4.0 +/- 1.7 GPa to 7.5 +/- 3.4 GPa. Failure modes included clamp failure, transverse (nanowire c-plane) fractures, and insufficient force from the MEMS test actuator.
Publisher
ELSEVIER SCIENCE SA
ISSN
0924-4247
Keyword (Author)
Tensile LoadingGallium NitrideNanowireSingle CrystalMechanical TestingMEMS
Keyword
GANCONTACTS

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