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- Jang, Ji-Hyun
- Structures & Sustainable Energy Lab.
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Chemically amplifed resists based on acrylate polymers containing ketal groups in the side chains
- Author(s)
- Kim, Jin-Baek, Park, Jong Jin, Jang, Ji-Hyun, Kim, Jae-Young
- Issued Date
- 1999-03-01
- Citation
- SPIE Conference on Advances in Resist Technology and Processing XV, v.3678
- Abstract
- We have examined a novel class of ketal based deep UV photoresist. 1,4-Dioxaspiro(4,4)nonane-2-methyl methacrylate was synthesized and polymerized. A ketal group of poly(1,4- dioxaspiro(4,4)nonane-2-methyl methacrylate) hydrolyzes under acid catalysis to give two alcohol functionalities and a cyclopentanone molecule. The ketal polymer is insoluble in an aqueous developer, while the hydrolyzed products are soluble.It was found the cyclopentanone product affects diffusion of acid in the resist. As a result, the generated cyclopentanone increases mobility of the acid significantly.
- Publisher
- SPIE
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