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- Jang, Ji-Hyun
- Structures & Sustainable Energy Lab.
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.conferencePlace | US | - |
| dc.citation.conferencePlace | Santa Clara, California | - |
| dc.citation.title | SPIE Conference on Advances in Resist Technology and Processing XV | - |
| dc.citation.volume | 3678 | - |
| dc.contributor.author | Kim, Jin-Baek | - |
| dc.contributor.author | Park, Jong Jin | - |
| dc.contributor.author | Jang, Ji-Hyun | - |
| dc.contributor.author | Kim, Jae-Young | - |
| dc.date.accessioned | 2023-12-20T06:38:41Z | - |
| dc.date.available | 2023-12-20T06:38:41Z | - |
| dc.date.created | 2014-12-23 | - |
| dc.date.issued | 1999-03-01 | - |
| dc.description.abstract | We have examined a novel class of ketal based deep UV photoresist. 1,4-Dioxaspiro(4,4)nonane-2-methyl methacrylate was synthesized and polymerized. A ketal group of poly(1,4- dioxaspiro(4,4)nonane-2-methyl methacrylate) hydrolyzes under acid catalysis to give two alcohol functionalities and a cyclopentanone molecule. The ketal polymer is insoluble in an aqueous developer, while the hydrolyzed products are soluble.It was found the cyclopentanone product affects diffusion of acid in the resist. As a result, the generated cyclopentanone increases mobility of the acid significantly. | - |
| dc.identifier.bibliographicCitation | SPIE Conference on Advances in Resist Technology and Processing XV, v.3678 | - |
| dc.identifier.doi | 10.1117/12.350247 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/52331 | - |
| dc.publisher | SPIE | - |
| dc.title | Chemically amplifed resists based on acrylate polymers containing ketal groups in the side chains | - |
| dc.type | Conference Paper | - |
| dc.date.conferenceDate | 1999-03-01 | - |
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