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신세운

Shin, Se-Un
PICTUS Lab.
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Optical Transmittance Improvements of Al2O3/TiO2 Multilayer OLED Encapsulation Films Processed by Atomic Layer Deposition

Author(s)
Shin, Se-UnRyu, Sang Ouk
Issued Date
2021-04
DOI
10.1007/s11664-020-08731-5
URI
https://scholarworks.unist.ac.kr/handle/201301/49990
Fulltext
https://www.springerprofessional.de/en/optical-transmittance-improvements-of-al2o3-tio2-multilayer-oled/18772674
Citation
JOURNAL OF ELECTRONIC MATERIALS, v.50, no.4, pp.2015 - 2020
Abstract
Encapsulation of organic light-emitting diodes (OLEDs) is the only way to prevent degradation due to the penetration of moisture and oxygen. However, the upper encapsulation layer, located in the path through which light from the OLED passes, adversely affects light transmission. In this study, we calculated the optical transmittance by using admittance trajectory simulation and compared the data with actual Al2O3/TiO2 multilayer film processed by atomic layer deposition (ALD). By applying the simulated data on to actual encapsulation layer, we can observe the optical transmittance increase of up to 8% compared to the film of Al2O3/TiO2/Al2O3 structure. Over 90% of optical transmittance was achieved for all the visible wavelength ranges while maintaining water vapor transmission rate (WVTR) of the processed multilayer thin film as low as of 5 × 10−5 g/m2/day, which was measured using MOCON Aquatran 2.
Publisher
Institute of Electrical and Electronics Engineers
ISSN
0361-5235
Keyword (Author)
Optical transmittanceOLED encapsulationALDTEMmultilayer

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