BROWSE

Related Researcher

Author's Photo

Lee, Zonghoon
Atomic-Scale Electron Microscopy (ASEM) Lab
Research Interests
  • Advanced Transmission Electron Microscopy (TEM/STEM), in Situ TEM, graphene, 2D materials, low-dimensional crystals, nanostructured materials

ITEM VIEW & DOWNLOAD

The Study on the Behavior of TiN Thin Film Growth According to Deposition Pressure in PECVD Process

Cited 0 times inthomson ciCited 0 times inthomson ci
Title
The Study on the Behavior of TiN Thin Film Growth According to Deposition Pressure in PECVD Process
Other Titles
플라즈마 화학 증착에서 증착압력에 따른 TiN의 성장거동
Author
Lee, ZonghoonNam, O.H.Lee, I.W.Kim, M.I.
Issue Date
1992-06
Publisher
한국열처리공학회
Citation
열처리공학회지, v.5, no.2, pp.95 - 102
Abstract
In this study, we tried to describe the quantitative model of TiN film structure which was deposited by PECVD process. The macro-grain growth behavior was studied at the various deposition pressures and times. As a result, It was confirmed that TiN films had the typical Zone 1 structure, and macro-columnar grains were, without reference to the deposition pressure, grown ballistic type by the growth-death competition following the equation, Y=aX², approximately obtained by regression analysis. Also, the thickness and the crystallization of TiN thin films were increased, the chlorine contents were decreased according to the decreasing of deposition pressure.
URI
https://scholarworks.unist.ac.kr/handle/201301/4929
ISSN
1225-1070
Appears in Collections:
MSE_Journal Papers
Files in This Item:
inJournal.pdf Download

find_unist can give you direct access to the published full text of this article. (UNISTARs only)

Show full item record

qrcode

  • mendeley

    citeulike

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

MENU