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Kim, Kyung Rok
Nano-Electronic Emerging Devices Lab.
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Physical modeling and analysis for performance enhancement of nanoscale silicon field-effect transistor-based plasmonic terahertz detector

Author(s)
Ryu, Min WooLee, Jeong SeopKim, Kyung Rok
Issued Date
2014-08-21
DOI
10.1109/NANO.2014.6968154
URI
https://scholarworks.unist.ac.kr/handle/201301/46910
Fulltext
http://ieeexplore.ieee.org/xpl/abstractKeywords.jsp?arnumber=6968154
Citation
2014 14th IEEE International Conference on Nanotechnology, IEEE-NANO 2014, pp.971 - 974
Abstract
In principle, the photoresponse can be enhanced by scaling down the gate oxide thickness (tox), which is a key structural parameter for the channel 2DEG density modulation. By using our TCAD simulation framework, we found that the enhanced photoresponse by reducing tox has been originated from the increase of 2DEG density modulation by the improved subthreshold swing (SSW) of FET and the decrease of 2DEG propagation length (i.e. more asymmetric 2DEG) by degradation of the normal field-dependent channel mobility.
Publisher
IEEE
ISBN
978-147995622-7

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