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- Kim, Taesung
- Microfluidics & Nanomechatronics Lab.
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CRACK-PHOTOLITHOGRAPHY” FOR HIGH-THROUGHPUT NANOPATTERNING AND NANOFLUIDIC APPLICATIONS
- Author(s)
- Kim, Minseok, Ha, Dogyeong, Kim, Taesung
- Issued Date
- 2015-06-23
- Citation
- 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015, pp.1366 - 1369
- Abstract
- We present an innovative cracking-assisted nanofabrication technique that relies only on a standard photolithography (photoresist patterning) process. This novel technique produces arbitrary-shaped nanopatterns with well-controlled, various geometric dimensions in a large-area and high-throughput manner. In addition, we show that mixed-scale patterns fabricated using the technique can be used as a master mold for replicating numerous nanofluidic devices via soft lithography, which to the best of our knowledge has not been reported previously in material-failure-based techniques including cracking.
- Publisher
- 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015
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