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김태성

Kim, Taesung
Microfluidics & Nanomechatronics Lab.
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dc.citation.conferencePlace US -
dc.citation.conferencePlace Anchorage -
dc.citation.endPage 1369 -
dc.citation.startPage 1366 -
dc.citation.title 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015 -
dc.contributor.author Kim, Minseok -
dc.contributor.author Ha, Dogyeong -
dc.contributor.author Kim, Taesung -
dc.date.accessioned 2023-12-19T22:10:39Z -
dc.date.available 2023-12-19T22:10:39Z -
dc.date.created 2015-10-26 -
dc.date.issued 2015-06-23 -
dc.description.abstract We present an innovative cracking-assisted nanofabrication technique that relies only on a standard photolithography (photoresist patterning) process. This novel technique produces arbitrary-shaped nanopatterns with well-controlled, various geometric dimensions in a large-area and high-throughput manner. In addition, we show that mixed-scale patterns fabricated using the technique can be used as a master mold for replicating numerous nanofluidic devices via soft lithography, which to the best of our knowledge has not been reported previously in material-failure-based techniques including cracking. -
dc.identifier.bibliographicCitation 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015, pp.1366 - 1369 -
dc.identifier.doi 10.1109/TRANSDUCERS.2015.7181186 -
dc.identifier.scopusid 2-s2.0-84955491140 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/35520 -
dc.identifier.url http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7181186 -
dc.language 영어 -
dc.publisher 18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015 -
dc.title CRACK-PHOTOLITHOGRAPHY” FOR HIGH-THROUGHPUT NANOPATTERNING AND NANOFLUIDIC APPLICATIONS -
dc.type Conference Paper -
dc.date.conferenceDate 2015-06-21 -

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