dc.citation.conferencePlace |
US |
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dc.citation.conferencePlace |
Anchorage |
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dc.citation.endPage |
1369 |
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dc.citation.startPage |
1366 |
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dc.citation.title |
18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015 |
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dc.contributor.author |
Kim, Minseok |
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dc.contributor.author |
Ha, Dogyeong |
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dc.contributor.author |
Kim, Taesung |
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dc.date.accessioned |
2023-12-19T22:10:39Z |
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dc.date.available |
2023-12-19T22:10:39Z |
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dc.date.created |
2015-10-26 |
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dc.date.issued |
2015-06-23 |
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dc.description.abstract |
We present an innovative cracking-assisted nanofabrication technique that relies only on a standard photolithography (photoresist patterning) process. This novel technique produces arbitrary-shaped nanopatterns with well-controlled, various geometric dimensions in a large-area and high-throughput manner. In addition, we show that mixed-scale patterns fabricated using the technique can be used as a master mold for replicating numerous nanofluidic devices via soft lithography, which to the best of our knowledge has not been reported previously in material-failure-based techniques including cracking. |
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dc.identifier.bibliographicCitation |
18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015, pp.1366 - 1369 |
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dc.identifier.doi |
10.1109/TRANSDUCERS.2015.7181186 |
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dc.identifier.scopusid |
2-s2.0-84955491140 |
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dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/35520 |
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dc.identifier.url |
http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7181186 |
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dc.language |
영어 |
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dc.publisher |
18th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2015 |
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dc.title |
CRACK-PHOTOLITHOGRAPHY” FOR HIGH-THROUGHPUT NANOPATTERNING AND NANOFLUIDIC APPLICATIONS |
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dc.type |
Conference Paper |
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dc.date.conferenceDate |
2015-06-21 |
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