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- Kim, Kyung Rok
- Nano-Electronic Emerging Devices Lab.
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Investigation of source-to-drain capacitance by DIBL effect of silicon nanowire MOSFETs
- Author(s)
- Cho, Seongjae, Kang, In Man, Kim, Kyung Rok
- Issued Date
- 2010-10
- Citation
- IEICE ELECTRONICS EXPRESS, v.7, no.19, pp.1499 - 1503
- Abstract
- We investigated the source-to-drain capacitance (C(sd)) due to DIBL effect of silicon nanowire (SNW) MOSFETs. Short-channel SNW devices operating at high drain voltages have the positive value of C(sd) by DIBL effect. On the other hand, junctionless SNW MOSFETs without source/drain (S/D) PN junctions have negative or zero values by small DIBL effect. By considering the additional source-to-drain capacitance component, the accuracy of a small-signal model was significantly improved on the imaginary part of Y(22)-parameter.
- Publisher
- IEICE-INST ELECTRONICS INFORMATION COMMUNICATIONS ENG
- ISSN
- 1349-2543
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