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신현석

Shin, Hyeon Suk
Lab for Carbon and 2D Materials
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An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography

Author(s)
Lee, SuokJung, SangheeJang, A-RangHwang, JaeseokShin, Hyeon SukLee, JaeJongKang, Dae Joon
Issued Date
2017-09
DOI
10.1039/c7nr00749c
URI
https://scholarworks.unist.ac.kr/handle/201301/22852
Fulltext
http://pubs.rsc.org/en/Content/ArticleLanding/2017/NR/C7NR00749C#!divAbstract
Citation
NANOSCALE, v.9, no.33, pp.11881 - 11887
Abstract
The fabrication of large-area and well-ordered nanostructures using lithographic techniques is challenging. We have developed novel approaches for sub-50 nm nanopatterning using an electrohydrodynamic lithography (EHL) technique by tailoring experimental parameters such as applied voltage, stamp features, filling ratio, and choice of resist film. We obtain a sub-50 nm pattern replica from a master stamp that contains an array of line patterns having 50 nm widths. Moreover, we show that a far-smaller pattern replication than the original pattern size can be readily obtained by carefully adjusting the experimental conditions. Perfect-and much smaller-pattern replicas have been realized from the master stamp with an array of hole patterns having a 400 nm hole size by tuning the filling ratio. We also demonstrate that an array of 30 nm graphene nanoribbons can be easily fabricated by exploring a hierarchical core-shell template structure employing a bilayer resist film via an EHL technique. The proposed minimal-contact patterning method is simple, versatile, and inexpensive and has potential to become a powerful technique for realizing feasible ultrafine nanostructures on a wafer scale.
Publisher
ROYAL SOC CHEMISTRY
ISSN
2040-3364
Keyword
THIN POLYMER-FILMSELECTRIC-FIELDLIQUID-FILMSALIGNMENT

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