There are no files associated with this item.
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.citation.endPage | 11887 | - |
dc.citation.number | 33 | - |
dc.citation.startPage | 11881 | - |
dc.citation.title | NANOSCALE | - |
dc.citation.volume | 9 | - |
dc.contributor.author | Lee, Suok | - |
dc.contributor.author | Jung, Sanghee | - |
dc.contributor.author | Jang, A-Rang | - |
dc.contributor.author | Hwang, Jaeseok | - |
dc.contributor.author | Shin, Hyeon Suk | - |
dc.contributor.author | Lee, JaeJong | - |
dc.contributor.author | Kang, Dae Joon | - |
dc.date.accessioned | 2023-12-21T21:46:30Z | - |
dc.date.available | 2023-12-21T21:46:30Z | - |
dc.date.created | 2017-09-19 | - |
dc.date.issued | 2017-09 | - |
dc.description.abstract | The fabrication of large-area and well-ordered nanostructures using lithographic techniques is challenging. We have developed novel approaches for sub-50 nm nanopatterning using an electrohydrodynamic lithography (EHL) technique by tailoring experimental parameters such as applied voltage, stamp features, filling ratio, and choice of resist film. We obtain a sub-50 nm pattern replica from a master stamp that contains an array of line patterns having 50 nm widths. Moreover, we show that a far-smaller pattern replication than the original pattern size can be readily obtained by carefully adjusting the experimental conditions. Perfect-and much smaller-pattern replicas have been realized from the master stamp with an array of hole patterns having a 400 nm hole size by tuning the filling ratio. We also demonstrate that an array of 30 nm graphene nanoribbons can be easily fabricated by exploring a hierarchical core-shell template structure employing a bilayer resist film via an EHL technique. The proposed minimal-contact patterning method is simple, versatile, and inexpensive and has potential to become a powerful technique for realizing feasible ultrafine nanostructures on a wafer scale. | - |
dc.identifier.bibliographicCitation | NANOSCALE, v.9, no.33, pp.11881 - 11887 | - |
dc.identifier.doi | 10.1039/c7nr00749c | - |
dc.identifier.issn | 2040-3364 | - |
dc.identifier.scopusid | 2-s2.0-85028426903 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/22852 | - |
dc.identifier.url | http://pubs.rsc.org/en/Content/ArticleLanding/2017/NR/C7NR00749C#!divAbstract | - |
dc.identifier.wosid | 000408435400008 | - |
dc.language | 영어 | - |
dc.publisher | ROYAL SOC CHEMISTRY | - |
dc.title | An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied | - |
dc.relation.journalResearchArea | Chemistry; Science & Technology - Other Topics; Materials Science; Physics | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | THIN POLYMER-FILMS | - |
dc.subject.keywordPlus | ELECTRIC-FIELD | - |
dc.subject.keywordPlus | LIQUID-FILMS | - |
dc.subject.keywordPlus | ALIGNMENT | - |
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Tel : 052-217-1404 / Email : scholarworks@unist.ac.kr
Copyright (c) 2023 by UNIST LIBRARY. All rights reserved.
ScholarWorks@UNIST was established as an OAK Project for the National Library of Korea.