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Jang, Hyun Jin
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Hawkes process-based technology impact analysis

Author(s)
Jang, HyunjinWoo, HangyunLee, Changyong
Issued Date
2017-05
DOI
10.1016/j.joi.2017.03.007
URI
https://scholarworks.unist.ac.kr/handle/201301/21863
Fulltext
http://www.sciencedirect.com/science/article/pii/S1751157716303169
Citation
JOURNAL OF INFORMETRICS, v.11, no.2, pp.511 - 529
Abstract
Patent citation analysis is considered a useful tool for technology impact analysis. However, the outcomes of previous methods do not provide a fair reflection of a technology's future prospects since they are based on deterministic approaches, assuming that future trends will remain the same as those in the past. As a remedy, we propose a Hawkes process-based patent citation analysis method to assess the future technological impact and uncertainty of a technology in a time period of interest by employing the future citation counts of the relevant patents as a quantitative proxy. For this, we construct a citation interval matrix from the United States Patent and Trademark Office (USPTO) database, and employ a Hawkes process a special case of path-dependent stochastic processes - as a method for patent citation forecasting. Specifically, the Hawkes process models the idiosyncratic and dynamic behaviours of a technology's evolution and obsolescence by increasing the likelihood of another subsequent citation by oneself (i.e., self-excitation) and decaying the likelihood back towards the initial level naturally. A case study of the patents about molecular amplification diagnosis technology shows that our method outperforms previous deterministic approaches in terms of accuracy and practicality.
Publisher
ELSEVIER SCIENCE BV
ISSN
1751-1577
Keyword (Author)
Technology impact analysisHawkes processesFuture technological impact and uncertaintyTechnology evolution and obsolescencePatent citation forecasting
Keyword
EXCITING POINT-PROCESSESEMERGING TECHNOLOGIESCITATION DISTRIBUTIONSCIENTIFIC LITERATUREPATENT QUALITYINDICATORSOBSOLESCENCESCIENCEPRODUCTIVITYINFORMATION

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