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Park, Lee Soon
School of Materials Science and Engineering
Research Interests
  • Flexible OLED new materials, process and fabrication
  • Touch Screen Panel(TSP) new materials and process new materials and process
  • Nano-materials synthesis and application (Ag nano-wire and metal mesh electrode)

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Fine Line Lithography를 위한 Polymer Resist에 관한 연구

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Title
Fine Line Lithography를 위한 Polymer Resist에 관한 연구
Other Titles
Studies on Polymer Resist for Fine Line Lithography
Author
Park, Lee SoonHa, Ki-RyongSon, Se-Mo
Issue Date
1993-03
Publisher
한국인쇄학회
Citation
한국인쇄학회지, v.11, no.1, pp.71 - 84
Abstract
Practically to put use high-photosensitive polymer, poly(vinyl cinnamoyl acetate), we investigated and confirmed UCHIDA`s synthesis, according to control solvent, which is the esterification of poly (vinyl alcohol) with monochloroacetic acid and can be freely conrolled the successive cinnamoyl acetoxyl esterfication of PVCiA, and intruducing photosensitizers,studied the photosensitivity of PVCiA.
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ISSN
1226-1149
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