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| DC Field | Value | Language |
|---|---|---|
| dc.citation.endPage | 84 | - |
| dc.citation.number | 1 | - |
| dc.citation.startPage | 71 | - |
| dc.citation.title | 한국인쇄학회지 | - |
| dc.citation.volume | 11 | - |
| dc.contributor.author | Park, Lee Soon | - |
| dc.contributor.author | Ha, Ki-Ryong | - |
| dc.contributor.author | Son, Se-Mo | - |
| dc.date.accessioned | 2023-12-22T13:06:43Z | - |
| dc.date.available | 2023-12-22T13:06:43Z | - |
| dc.date.created | 2015-09-23 | - |
| dc.date.issued | 1993-03 | - |
| dc.description.abstract | Practically to put use high-photosensitive polymer, poly(vinyl cinnamoyl acetate), we investigated and confirmed UCHIDA`s synthesis, according to control solvent, which is the esterification of poly (vinyl alcohol) with monochloroacetic acid and can be freely conrolled the successive cinnamoyl acetoxyl esterfication of PVCiA, and intruducing photosensitizers,studied the photosensitivity of PVCiA. | - |
| dc.identifier.bibliographicCitation | 한국인쇄학회지, v.11, no.1, pp.71 - 84 | - |
| dc.identifier.issn | 1226-1149 | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/17171 | - |
| dc.identifier.url | http://scholar.ndsl.kr/schArticleDetail.do?cn=JAKO199311920248262 | - |
| dc.language | 한국어 | - |
| dc.publisher | 한국인쇄학회 | - |
| dc.title.alternative | Studies on Polymer Resist for Fine Line Lithography | - |
| dc.title | Fine Line Lithography를 위한 Polymer Resist에 관한 연구 | - |
| dc.type | Article | - |
| dc.description.journalRegisteredClass | other | - |
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