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Atomic Force-Scanning Electrochemical Microscopy (AFM-SECM) Combined with Alternating Current Measurements

Shin, Heungjoo , None

Conference Paper Issue Date2007-02-05 View5

Atomic layer deposited beryllium oxide: Effective passivation layer for III-V metal/oxide/semiconductor devices File

Yum, J. H. , Akyol, T. , Lei, M. , Hudnall, T. , Bersuker, G. , Downer, M. , Bielawski, C. W. , Lee, J. C. , Banerjee, S. K.

Article Issue Date2011-03 View5

Atomic layer deposited Mo2N thin films using Mo(CO)(6) and NH3 plasma as a Cu diffusion barrier File

Joo, Yong-Hwan , Nandi, Dip K. , Ramesh, Rahul , Jang, Yujin , Bae, Jong-Seong , Cheon, Taehoon , Kim, Soo-Hyun

Article Issue Date2021-03 View3

Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction File

Oh, Seungtaeg , Kim, Jun Beom , Song, Jun Tae , Oh, Jihun , Kim, Soo-Hyun

Article Issue Date2017-02 View10

Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization File

Kim, Jun Beom , Kim, Soo-Hyun , Han, Won Seok , Lee, Do-Joong

Article Issue Date2016-07 View9

Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects File

Kim, Youn-Hye , Kim, Minsu , Kotsugi, Yohei , Cheon, Taehoon , Mohapatra, Debananda , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Ramesh, Rahul , An, Ki-Seok , et al

Article Issue Date2022-10 View23

Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects File

Lee, Hyun-Jung , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2016-11 View6

Atomic layer deposited zinc oxysulfide anodes in Li-ion batteries: an efficient solution for electrochemical instability and low conductivity File

Sinha, Soumyadeep , Ramasamy, Hari Vignesh , Nandi, Dip K. , Didwal, Pravin N. , Cho, Jae Yu , Park, Chan-Jin , Lee, Yun-Sung , Kim, Soo-Hyun , Heo, Jaeyeong

Article Issue Date2018-09 View8

Atomic layer deposited-ZnO@3D-Ni-foam composite for Na-ion battery anode: A novel route for easy and efficient electrode preparation File

Sinha, Soumyadeep , Didwal, Pravin N. , Nandi, Dip K. , Cho, Jae Yu , Kim, Soo-Hyun , Park, Chan-Jin , Heo, Jaeyeong

Article Issue Date2019-01 View9

Atomic Layer Deposition for Improving Performance and Safety of Li-ion Batteries

Jung, Yoon Seok

Conference Paper Issue Date2014-04-18 View2

Atomic Layer Deposition for Improving Performance and Safety of Li-ion Batteries

Jung, Yoon Seok

Conference Paper Issue Date2014-07-09 View3

Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules File

Jang, Byeonghyeon , Kim, Soo-Hyun

Article Issue Date2016-07 View5

Atomic Layer Deposition of Co Using N-2/H-2 Plasma as a Reactant File

Yoon, Jaehong , Lee, Han-Bo-Ram , Kim, Doyoung , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Hyungjun

Article Issue Date2011-10 View5

Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone File

Jandhyala, Srikar , Mordi, Greg , Lee, Bongki , Lee, Geunsik , Floresca, Carlo , Cha, Pil-Ryung , Ahn, Jinho , Wallace, Robert M. , Chabal, Yves J. , Kim, Moon J. , et al

Article Issue Date2012-02 View5

Atomic Layer Deposition of Epitaxial Ferroelectric Hf0.5Zr0.5O2 Thin Films File

Cho, Jung Woo , Song, Myeong Seop , Choi, In Hyeok , Go, Kyoung-June , Han, Jaewoo , Lee, Tae Yoon , An, Chihwan , Choi, Hyung-Jin , Sohn, Chang Hee , Park, Min Hyuk , et al

Article Issue Date2024-02 View12

Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu File

Han, Seung-Min , Nandi, Dip K. , Joo, Yong-Hwan , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Nabeya, Shunichi , Harada, Ryosuke , Kim, Soo-Hyun

Article Issue Date2020-05 View5

Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen File

Park, Na-Yeon , Kim, Minsu , Kim, Youn-Hye , Ramesh, Rahul , Nandi, Dip K. , Tsugawa, Tomohiro , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Harada, Ryosuke , Kim, Miso , et al

Article Issue Date2022-02 View27

Atomic layer deposition of low-resistivity and high-density tungsten nitride thin films using B2H6, WF6, and NH3 File

Kim, Soo-Hyun , Kim, JK , Kwak, N , Sohn, H , Kim, J , Jung, SH , Hong, MR , Lee, SH , Collins, J

Article Issue Date2006-01 View16

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects File

Kotsugi, Yohei , Han, Seung-Min , Kim, Youn-Hye , Cheon, Taehoon , Nandi, Dip K. , Ramesh, Rahul , Yu, Neung-Kyung , Son, Kirak , Tsugawa, Tomohiro , Ohtake, Shigeyuki , et al

Article Issue Date2021-07 View6

Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant File

Hong, Tae Eun , Mun, Ki-Yeung , Choi, Sang-Kyung , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Kim, Woo Kyoung , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2012-07 View6

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