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Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction File

Oh, Seungtaeg , Kim, Jun Beom , Song, Jun Tae , Oh, Jihun , Kim, Soo-Hyun

Article Issue Date2017-02 View9

Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization File

Kim, Jun Beom , Kim, Soo-Hyun , Han, Won Seok , Lee, Do-Joong

Article Issue Date2016-07 View8

Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects File

Kim, Youn-Hye , Kim, Minsu , Kotsugi, Yohei , Cheon, Taehoon , Mohapatra, Debananda , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Ramesh, Rahul , An, Ki-Seok , et al

Article Issue Date2022-10 View22

Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects File

Lee, Hyun-Jung , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2016-11 View6

Atomic layer deposited zinc oxysulfide anodes in Li-ion batteries: an efficient solution for electrochemical instability and low conductivity File

Sinha, Soumyadeep , Ramasamy, Hari Vignesh , Nandi, Dip K. , Didwal, Pravin N. , Cho, Jae Yu , Park, Chan-Jin , Lee, Yun-Sung , Kim, Soo-Hyun , Heo, Jaeyeong

Article Issue Date2018-09 View6

Atomic layer deposited-ZnO@3D-Ni-foam composite for Na-ion battery anode: A novel route for easy and efficient electrode preparation File

Sinha, Soumyadeep , Didwal, Pravin N. , Nandi, Dip K. , Cho, Jae Yu , Kim, Soo-Hyun , Park, Chan-Jin , Heo, Jaeyeong

Article Issue Date2019-01 View8

Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules File

Jang, Byeonghyeon , Kim, Soo-Hyun

Article Issue Date2016-07 View4

Atomic Layer Deposition of Co Using N-2/H-2 Plasma as a Reactant File

Yoon, Jaehong , Lee, Han-Bo-Ram , Kim, Doyoung , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Hyungjun

Article Issue Date2011-10 View5

Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu File

Han, Seung-Min , Nandi, Dip K. , Joo, Yong-Hwan , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Nabeya, Shunichi , Harada, Ryosuke , Kim, Soo-Hyun

Article Issue Date2020-05 View3

Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen File

Park, Na-Yeon , Kim, Minsu , Kim, Youn-Hye , Ramesh, Rahul , Nandi, Dip K. , Tsugawa, Tomohiro , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Harada, Ryosuke , Kim, Miso , et al

Article Issue Date2022-02 View20

Atomic layer deposition of low-resistivity and high-density tungsten nitride thin films using B2H6, WF6, and NH3 File

Kim, Soo-Hyun , Kim, JK , Kwak, N , Sohn, H , Kim, J , Jung, SH , Hong, MR , Lee, SH , Collins, J

Article Issue Date2006-01 View15

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects File

Kotsugi, Yohei , Han, Seung-Min , Kim, Youn-Hye , Cheon, Taehoon , Nandi, Dip K. , Ramesh, Rahul , Yu, Neung-Kyung , Son, Kirak , Tsugawa, Tomohiro , Ohtake, Shigeyuki , et al

Article Issue Date2021-07 View3

Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant File

Hong, Tae Eun , Mun, Ki-Yeung , Choi, Sang-Kyung , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Kim, Woo Kyoung , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2012-07 View6

Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant File

Jung, Jae-Hun , Lee, Seung-Joon , Lee, Hyun-Jung , Lee, Min Young , Cheon, Taehoon , Bae, So Ik , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , et al

Article Issue Date2015-11 View6

Atomic Layer Deposition of RuAlO Thin Films as a Diffusion Barrier for Seedless Cu Interconnects File

Cheon, Taehoon , Choi, Sang-Hyeok , Kim, Soo-Hyun , Kang, Dae-Hwan

Article Issue Date2011-03 View7

Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization File

Yeo, Seungmin , Choi, Sang-Hyeok , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2013-11 View7

Atomic layer deposition of Ti-doped ZnO films with enhanced electron mobility File

Lee, Do-Joong , Kim, Ki-Ju , Kim, Soo-Hyun , Kwon, Jang-Yeon , Xu, Jimmy , Kim, Ki-Bum

Article Issue Date2013-06 View8

Atomic layer deposition of tungsten and tungsten-based compounds using WCl5 and various reactants selected by density functional theory File

Lee, Minyoung , Hidayat, Romel , Nandi, Dip K. , Kim, Tae Hyun , Kim, Yewon , Kim, Seongyoon , Lee, Won -Jun , Kim, Soo-Hyun

Article Issue Date2021-10 View8

Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H2S: thin film catalyst for water splitting File

Kim, Deok-Hyun , Ramesh, Rahul , Nandi, Dip K. , Bae, Jong-Seong , Kim, Soo-Hyun

Article Issue Date2021-02 View4

Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier File

Kim, Jun Beom , Nandi, Dip K. , Kim, Tae Hyun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2019-09 View9

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