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Shin, Hyung-Joon
Nanoscale Materials Science Lab.
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Artificial synaptic behaviors of a mobile silver-doped vanadium-cerium oxide memristor with embedded silver nanoclusters for neuromorphic computing applications

Author(s)
Ryu, JiyeonChung, Peter HayoungYoon, CheolhwanKang, MinkookShin, Hyung-JoonYoon, Tae-Sik
Issued Date
2026-04
DOI
10.1039/d5nr05056a
URI
https://scholarworks.unist.ac.kr/handle/201301/91574
Fulltext
https://pubs.rsc.org/en/content/articlelanding/2026/nr/d5nr05056a
Citation
NANOSCALE, v.18, no.14, pp.7692 - 7709
Abstract
Although mobile metal-ion-based filamentary memristors are explored as an artificial synapse for neuromorphic computing, they suffer from abrupt and stochastic switching. Hence, this study reports a non-filamentary synaptic memristor using mobile silver-doped vanadium-cerium oxide (VCeOx:Ag) that achieves linear and symmetric conductance modulation with stable endurance over 104 potentiation/depression cycles through a conduction combined with Ag nanoclusters and redistributed mobile Ag ions. This conjugated contribution enables polarity-dependent, robust and reproducible analog switching. Transmission electron microscopy (TEM) analysis confirms the presence of Ag nanoclusters, and Kelvin probe force microscopy (KPFM) verifies the field-driven migration and redistribution of residual Ag ions. Time-dependent synaptic plasticity properties, including paired-pulse facilitation (PPF), post-tetanic potentiation (PTP), spike-rate-dependent plasticity (SRDP) and short-term-to-long-term memory (STM-to-LTM) transitions, are harnessed to implement reservoir computing (RC), which achieves classification accuracies of 90.6% and 76.7% for handwritten digit-MNIST and Fashion-MNIST datasets, respectively. These findings highlight that the VCeOx:Ag memristor with a complementary mechanism enables an unprecedented control of analog conductance and paves the way for developing scalable, energy-efficient neuromorphic hardware for edge artificial intelligence (AI) and on-device learning.
Publisher
ROYAL SOC CHEMISTRY
ISSN
2040-3364

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