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Defect-Rich Cu2O Nanospheres as a Fenton-Like Catalyst for Cu(III) Generation: Enhanced Inactivation of Antibiotic-Resistant Bacteria and Genes

Author(s)
Cho, JiyoonLee, JaewooLee, Alex TaekyungKim, YeongjaeKang, DongwooKim, JoohyunPark, Erwin JongwooLee, JuriKim, KangJung, MuhoHyeon, TaeghwanLee, Changha
Issued Date
2025-08
DOI
10.1021/acsnano.5c06402
URI
https://scholarworks.unist.ac.kr/handle/201301/91408
Fulltext
https://pubs.acs.org/doi/10.1021/acsnano.5c06402?src=getftr&utm_source=clarivate&getft_integrator=clarivate
Citation
ACS NANO, v.19, no.33, pp.30137 - 30150
Abstract
Cupryl species (Cu(III)) are promising oxidants for degrading recalcitrant organic contaminants and harmful microorganisms in water. In this study, defect-rich cuprous oxide (D-Cu2O) nanospheres (NSs) are introduced as a Fenton-like catalyst to generate Cu(III) for the inactivation of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs). D-Cu2O, in the presence of H2O2, achieved inactivation efficiencies 3.2, 3.0, and 2.4 times higher than those of control Cu2O for ARB, extracellular ARGs (e-ARGs), and intracellular ARGs (i-ARGs), respectively. Experimental evidence from oxidant scavenging tests, Cu(III)-periodate complexation assays, electron paramagnetic resonance (EPR), and in situ Raman spectroscopy confirmed that D-Cu2O significantly enhanced Cu(III) generation when reacting with H2O2 compared to control Cu2O. Density functional theory (DFT) calculations further revealed that unsaturated copper atoms in D-Cu2O enhance H2O2 adsorption by improving the structural accessibility of adjacent oxygen atoms. This facilitates electron transfer processes and promotes subsequent Cu(III) generation. The D-Cu2O/H2O2 system demonstrated excellent reusability, maintaining a 4-log reduction of ARB over five cycles, and proved effective across various water matrices and microbial species. These findings highlight the potential of the D-Cu2O/H2O2 system, driven by defect engineering, as a robust platform for enhancing water safety and advancing sustainable disinfection technologies.
Publisher
AMER CHEMICAL SOC
ISSN
1936-0851
Keyword (Author)
defect engineeringcuprousoxideFenton-likecatalystscupryl speciesantibiotic-resistantbacteriaantibiotic-resistance geneswater disinfection
Keyword
HYDROGEN-PEROXIDEWATER-TREATMENTCOPPERDISINFECTIONCO2NANOMATERIALSDEGRADATIONMECHANISMSEFFICIENCYCHLORINE

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