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dc.citation.conferencePlace HK -
dc.citation.title IEEE Electron Devices Technology and Manufacturing Conference -
dc.contributor.author Kim, Sanghyeon -
dc.contributor.author Kim, Seongkwang -
dc.contributor.author Lim, HyeongRak -
dc.contributor.author Jeong, Jaeyong -
dc.contributor.author Park, Youngkeun -
dc.contributor.author Jeong, Jaejoong -
dc.contributor.author Kim, Joonpyo -
dc.contributor.author Kim, Bongho -
dc.contributor.author Geum, Daemyeong -
dc.contributor.author Kim, Younghyun -
dc.contributor.author Cho, Byung Jin -
dc.date.accessioned 2026-03-27T14:02:43Z -
dc.date.available 2026-03-27T14:02:43Z -
dc.date.created 2026-03-26 -
dc.date.issued 2025-03-09 -
dc.description.abstract Complementary field-effect transistors (CFETs) have been seriously studied for next-generation device architectures to improve PPA (power, performance, and area). However, many challenges remain, including process integration, structure optimization, implementation schemes (monolithic/sequential), etc. At the transistor level, unbalanced transport between n- and p-FET would be one of the most critical issues because CFETs inherently require the same width both for n- and p-FETs. Furthermore, new parameters such as spacing length between top and bottom FETs have emerged. Here, we discuss the opportunity for heterogeneous channel design to mitigate these issues. -
dc.identifier.bibliographicCitation IEEE Electron Devices Technology and Manufacturing Conference -
dc.identifier.doi 10.1109/EDTM61175.2025.11041288 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/91120 -
dc.identifier.url https://ieeexplore.ieee.org/abstract/document/11041288 -
dc.language 영어 -
dc.publisher IEEE -
dc.title Heterogeneous 3D CFET with Hybrid Channel Configuration -
dc.type Conference Paper -
dc.date.conferenceDate 2025-03-09 -

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