File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
Related Researcher

권순용

Kwon, Soon-Yong
Frontier, Innovative Nanomaterials & Devices Lab.
Read More

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Contact Physics in 2D Nanoelectronics: Comparative Study of Type-II Weyl and Dirac Semimetals

Author(s)
Han, JuwonLee, HyeonwooLee, YouseungKim, TaehyunShin, SeokyeonLee, YoungjoonKwon, Soon-YongJeong, Changwook
Issued Date
2025-11
DOI
10.1021/acsnano.5c09640
URI
https://scholarworks.unist.ac.kr/handle/201301/89693
Citation
ACS NANO, v.19, no.43, pp.37692 - 37701
Abstract
The demand for low contact resistance in two-dimensional (2D) nanoelectronics has positioned semimetals as ideal contact materials, owing to their ability to minimize the formation of metal-induced gap states (MIGS). While the contact physics of Dirac semimetals is well understood, type-II Weyl (i.e., Weyl-II) semimetals remain largely unexplored, despite their unique potential for achieving defect-free nanoscale devices. Here, using density functional theory (DFT), we elucidate the interfacial physics of MoS2-Weyl-II semimetal junctions and conduct a comparative analysis with Dirac semimetals. Crucially, we identify a downward extension of the conduction band minimum (CBM) in MoS2, originating from contact-induced interfacial states. This phenomenon is closely tied to the rectangular Brillouin zone of Weyl-II semimetals, which-unlike the 3-fold symmetry of MoS2 and Dirac semimetals-renders orbital hybridization in MoS2-Weyl-II systems highly sensitive to contact angles. By introducing a modified Schottky-Mott rule that accounts for vacuum level shifts, CBM extensions, and orbital interactions, we significantly improve conventional Schottky barrier height predictions. This approach effectively resolves longstanding theoretical-experimental discrepancies, providing a robust framework to properly design and optimize 2D contacts in next-generation logic devices.
Publisher
AMER CHEMICAL SOC
ISSN
1936-0851
Keyword (Author)
Schottky barrier height (SBH)Fermi-level pinning (FLP)Metal-induced gap states (MIGS)van der Waals interfacesTransition metal dichalcogenidesSemimetal contactsSchottky-Mott rule

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.