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- Kim, Soo-Hyun
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Highly-conductive ALD-WCx thin films using a new fluorine-free W precursor for Cu & Ru interconnects
- Author(s)
- Seo, Dongbeom, 김상복, Kim, Soo-Hyun
- Issued Date
- 2025-06-24
- Citation
- AVS 25th International Conference on Atomic Layer Deposition & the 12th International Atomic Layer Etching Workshop (ALD/ALE 2025)
- Publisher
- AVS (American Vacuum Society)
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