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- Kim, Soo-Hyun
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| DC Field | Value | Language |
|---|---|---|
| dc.citation.conferencePlace | KO | - |
| dc.citation.title | AVS 25th International Conference on Atomic Layer Deposition & the 12th International Atomic Layer Etching Workshop (ALD/ALE 2025) | - |
| dc.contributor.author | Seo, Dongbeom | - |
| dc.contributor.author | 김상복 | - |
| dc.contributor.author | Kim, Soo-Hyun | - |
| dc.date.accessioned | 2025-12-29T17:33:25Z | - |
| dc.date.available | 2025-12-29T17:33:25Z | - |
| dc.date.created | 2025-12-26 | - |
| dc.date.issued | 2025-06-24 | - |
| dc.identifier.bibliographicCitation | AVS 25th International Conference on Atomic Layer Deposition & the 12th International Atomic Layer Etching Workshop (ALD/ALE 2025) | - |
| dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/89447 | - |
| dc.publisher | AVS (American Vacuum Society) | - |
| dc.title | Highly-conductive ALD-WCx thin films using a new fluorine-free W precursor for Cu & Ru interconnects | - |
| dc.type | Conference Paper | - |
| dc.date.conferenceDate | 2025-06-22 | - |
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